Zobrazeno 1 - 1
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pro vyhledávání: '"Chun-Ching Tsan"'
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17:2341
A detailed study for the high density plasma chemical vapor deposition (HDP-CVD) process was presented to prevent metal distortion issues and metal corrosion risk. The deposition temperature increased and then saturated as the film deposited, based o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e156b5f80bbf5acce3311c8c50cb0de2
https://doi.org/10.1116/1.590915
https://doi.org/10.1116/1.590915
