Zobrazeno 1 - 1
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pro vyhledávání: '"Chun Kwan-Young"'
Publikováno v:
SPIE Proceedings.
Because extreme ultra violet (EUV) lithography is not ready due to technical challenges and low throughput, we are facing severe limitation for sub-20nm node patterning even though the extreme resolution enhancement technology (RET) such as the off-a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f84bf3a98be964eda808af987940da23
https://doi.org/10.1117/12.964976
https://doi.org/10.1117/12.964976
