Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Christopher M. Bottoms"'
Publikováno v:
The Journal of Physical Chemistry B. 126:6562-6574
Polymeric chemically amplified resists (CARs) are critical materials for high-throughput lithographic processes. A photoactivated acid-anion catalyst changes the polymer's solubility via a deprotection reaction, which enables pattern development thro
Publikováno v:
Advances in Patterning Materials and Processes XL.
Publikováno v:
Macromolecules. 54:1912-1925
The acid-catalyzed deprotection of glassy polymer resins is an important process in semiconductor lithography. Studies have shown that the reaction kinetics in these materials is controlled by slow...
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
Catalyst diffusion is a critical component of the pattern formation process in chemically amplified resists (CARs). In this study, we used a concerted experimental and modeling effort to examine diffusion of an inert catalyst analogue (sodium triflat