Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Christopher Liman"'
Autor:
F. Delachat, Christopher Liman, Raluca Tiron, Ahmed Gharbi, Daniel F. Sunday, Guillaume Freychet, R. Joseph Kline
Publikováno v:
Journal of Applied Crystallography. 52:106-114
The directed self-assembly (DSA) of block copolymers (BCPs) is a promising low-cost approach to patterning structures with critical dimensions (CDs) which are smaller than can be achieved by traditional photolithography. The CD of contact holes can b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a524a09000bf84a07061119f575235af
https://doi.org/10.1107/s1600576718017272
https://doi.org/10.1107/s1600576718017272
Autor:
Michael J. Maher, C. Grant Willson, Summer Tein, Christopher J. Ellison, R. Joseph Kline, Christopher Liman, Adam F. Hannon, Gregory Blachut, Daniel F. Sunday, Yusuke Asano
Publikováno v:
Macromolecules. 51:173-180
Advancements in the directed self-assembly of block copolymers (BCPs) have prompted the development of new materials with larger effective interaction parameters (χe). This enables BCP systems with phase separation at increasingly small degrees of p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::79e603e273bfcdaa2e199e4509c09678
https://doi.org/10.1021/acs.macromol.7b01982
https://doi.org/10.1021/acs.macromol.7b01982
Publikováno v:
Journal of Applied Crystallography. 50:1677-1690
There is a need to characterize nanoscale molecular orientation in soft materials, and polarized scattering is a powerful means to measure this property. However, few approaches have been demonstrated that quantitatively relate orientation to scatter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71856291b4129344da2dfe70122bfcb2
https://doi.org/10.1107/s160057671701408x
https://doi.org/10.1107/s160057671701408x
Autor:
Jiaxing Ren, R. Joseph Kline, Paul F. Nealey, Lance Williamson, Daniel F. Sunday, Christopher Liman, Roel Gronheid
Publikováno v:
ACS Applied Materials & Interfaces. 9:31325-31334
The directed self-assembly (DSA) of block copolymers (BCPs) is a potential solution for patterning critical features for integrated circuits at future technology nodes. For this process to be implemented, there needs to be a better understanding of h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::147824fdea579b963efe1e71b9e138cd
https://doi.org/10.1021/acsami.7b02791
https://doi.org/10.1021/acsami.7b02791
Autor:
Alice B. Chang, Robert H. Grubbs, Christopher Liman, Mark W. Matsen, Christopher L. Soles, Daniel F. Sunday, Eliot Gann, Dean M. DeLongchamp, Lars Thomsen
Publikováno v:
Macromolecules
Bottlebrush block copolymers offer rich opportunities for the design of complex hierarchical materials. As consequences of the densely grafted molecular architecture, bottlebrush polymers can adopt highly extended backbone conformations and exhibit u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9515b024ab67361699582f62686a4d8b
https://europepmc.org/articles/PMC7539631/
https://europepmc.org/articles/PMC7539631/
Autor:
Adam F. Hannon, Juan J. de Pablo, Christopher Liman, Jiaxing Ren, Paul F. Nealey, R. Joseph Kline, Daniel F. Sunday, Xuanxuan Chen, Hyo Seon Suh
Publikováno v:
Advances in Patterning Materials and Processes XXXIV.
The semiconductor industry is evaluating a variety of approaches for the cost efficient production of future processing and memory generations. Amongst the technologies being explored are multiple patterning steps, extreme ultraviolet (EUV) lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b63225a2f242d8d55e0524c950f2fe15
https://doi.org/10.1117/12.2258047
https://doi.org/10.1117/12.2258047