Zobrazeno 1 - 10
of 928
pro vyhledávání: '"Christopher K Ober"'
Publikováno v:
Journal of Photopolymer Science and Technology. 35:29-33
Autor:
Yusuke Otsubo, Kazunori Sakai, Kazuki Kasahara, Hong Xu, Emmanuel P. Giannelis, Christopher K. Ober
Publikováno v:
Journal of Photopolymer Science and Technology. 35:101-104
Autor:
Zhongyang Wang, Chaoqiuyu Wang, Yangyang Sun, Kai Wang, Joseph W. Strzalka, Shrayesh N. Patel, Paul F. Nealey, Christopher K. Ober, Fernando A. Escobedo
Publikováno v:
ACS Nano. 16:20714-20729
Akademický článek
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Autor:
Jingyuan Deng, Sean Bailey, Ruiwen Ai, Anthony Delmonico, Gregory Denbeaux, Shaoyi Jiang, Christopher K. Ober
Publikováno v:
ACS Macro Letters. 11:1049-1054
Conventional chemically amplified resists (CARs) rely on the usage of photoacid generators to serve as the source of chemical amplification. However, acid diffusion inevitably accompanies CARs and has led to the resolution, line edge roughness, and s
Autor:
Shuhan Ding, Yiling Peng, Benyamin Davaji, Peter C. Doerschuk, Amit Lal, Jeremy Clark, Garry Bordonaro, Vincent Genova, Christopher K. Ober, Steve Ayres, Marco Heuser
Publikováno v:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Amanda K. Leonardi, Riddhiman Medhi, Aria Zhang, Nilay Düzen, John A. Finlay, Jessica L. Clarke, Anthony S. Clare, Christopher K. Ober
Publikováno v:
Biomacromolecules. 23:2697-2712
Biofouling is a major disruptive process affecting the fuel efficiency and durability of maritime vessel coatings. Previous research has shown that amphiphilic coatings consisting of a siloxane backbone functionalized with hydrophilic moieties are ef
Autor:
Tommaso J Giammaria, Michele Laus, Riccardo Chiarcos, Christopher K Ober, Gabriele Seguini, Michele Perego
Publikováno v:
Polymer International. 71:426-435
Autor:
Xiangxi Z. Meng, Florian H. Käfer, Gregory M. Wallraff, Christopher K. Ober, Rachel A. Segalman
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.