Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Christopher E. Dube"'
Autor:
Dean Buzby, Russell J. Low, Christopher E. Dube, Basil Tsefrekas, Robert Tavares, Weiming Zhang, Atul Gupta, Wesley Skinner, James Mullin
Publikováno v:
Energy Procedia. 8:706-711
In this paper we present recent advances of the Varian patterned ion implantation selective emitter solar cell process, Solion Blue. Varian's ion implantation system, known as Solion, is currently deployed in manufacturing. This novel doping approach
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ebcfdb54a916a1468e37ff839c3fd849
https://doi.org/10.1016/j.egypro.2011.06.205
https://doi.org/10.1016/j.egypro.2011.06.205
Publikováno v:
2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC).
During testing of a new contact resistance measurement system (ContactSpot), we observed several unexpected results. TLM theory predicts a linear dependence of the resistance measurements vs probe spacing, and from this data set the contact resistanc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::037206bc37955fbeffad524e05b4ac9a
https://doi.org/10.1109/pvsc.2015.7355851
https://doi.org/10.1109/pvsc.2015.7355851
Autor:
Peter J. Bonitatebus, Christopher E. Dube, William H. Armstrong, Sumitra Mukhopadhyay, Richard J. Staples
Publikováno v:
Inorganic Chemistry. 44:5161-5175
A series of adamantane-shaped [Mn4O6]4+ aggregates has been prepared. Ligand substitution reactions of [Mn4O6(bpea)4](ClO4)4 (1) with tridentate amine and iminodicarboxylate ligands in acetonitrile affords derivative clusters [Mn4O6(tacn)4](ClO4)4 (4
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::288c50c162e272b17aee8173bc33537e
https://doi.org/10.1021/ic050183w
https://doi.org/10.1021/ic050183w
Publikováno v:
2014 IEEE 40th Photovoltaic Specialist Conference (PVSC).
In the present paper we highlight the results on passivation of the ion implanted boron emitters using a batch atomic layer deposition (ALD) - AlO x process. We demonstrate that through optimization of the batch ALD process we can achieve extremely l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::724fbacb98fa3b9d30bae47d91c3fa18
https://doi.org/10.1109/pvsc.2014.6924984
https://doi.org/10.1109/pvsc.2014.6924984
Publikováno v:
2013 IEEE 39th Photovoltaic Specialists Conference (PVSC).
We present improvements in c-Si solar cell performance for high sheet resistance (Rsheet) emitters fabricated by ion implantation. We have investigated the effect of sheet resistance (60-115 Ω/sq) on cell efficiency (CE) and also evaluated the effec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4f9ef9b670a1b55d4c2cefeaac603b6
https://doi.org/10.1109/pvsc.2013.6744904
https://doi.org/10.1109/pvsc.2013.6744904
Publikováno v:
2012 38th IEEE Photovoltaic Specialists Conference.
This paper presents work assessing the cell-to-module (CTM) efficiency loss of ion implant (IMP) cells in comparison with POCl 3 (POCl) diffusion cells, using both standard EVA and silicone encapsulants. In order to reduce uncertainty in CTM loss ana
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad1de51eed150389be3162eac206b011
https://doi.org/10.1109/pvsc.2012.6318067
https://doi.org/10.1109/pvsc.2012.6318067
Publikováno v:
2012 38th IEEE Photovoltaic Specialists Conference.
In this paper we present the improvements in cell performance for ion implanted C-Si solar cells by thermal oxidation. We have investigated the effect of oxidation on cell efficiency (CE) and systematically evaluated the effect of oxide thickness on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c13d758e1012c89396d6719336bd4fde
https://doi.org/10.1109/pvsc.2012.6318017
https://doi.org/10.1109/pvsc.2012.6318017
Autor:
Kevin M. Daniels, Basil Tsefrekas, Christopher E. Dube, Wesley Skinner, James Mullin, Bhosle Vikram M, Paul Sullivan
Publikováno v:
AIP Conference Proceedings.
This paper reports the benefits of using patterned ion implantation to create higher efficiency selective emitter solar cells. This doping approach uses in-situ masking to enable selective doping of the contact and field regions of the emitter in a s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e664fcf05dfa3f31b68c0871984e6b49
https://doi.org/10.1063/1.4766489
https://doi.org/10.1063/1.4766489