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of 3
pro vyhledávání: '"Christophe Soonekindt"'
Autor:
Mirko Beyer, Tobias Gunther, Dan Koronel, Vijeet Gupta, Govinda Soni, Torsten Billasch, Christophe Soonekindt, Robert van Oostrum, Remo Kirsch
Publikováno v:
25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014).
In this paper we demonstrate a sensitivity improvement on a Nitride Strip layer at the Shallow Trench Isolation (STI) process module and how this sensitivity was later used to improve yield monitoring. The improvement was enabled due to optics enhanc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd679304c7f9595714a49c4caf9a62fc
https://doi.org/10.1109/asmc.2014.6847020
https://doi.org/10.1109/asmc.2014.6847020
Autor:
Christophe Soonekindt, Jean-Christophe Le-Denmat, Blandine Minghetti, B. Icard, Jérôme Todeschini, Laurent Pain, S. Manakli
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 6:033001
After the successful results obtained in the last few years, electron beam direct write (EBDW) lithography for use in integrated circuit manufacturing has now been demonstrated. However, throughput and resolution capabilities need to be improved to p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e51a45e2c6b67423f5107bc510d95f4d
https://doi.org/10.1117/1.2770472
https://doi.org/10.1117/1.2770472
Autor:
Serdar Manakli, Christophe Soonekindt, Laurent Pain, Jean-Christophe Le-Denmat, Je´ro^me Todeschini, Be´atrice Icard, Blandine Minghetti
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Jul2007, Vol. 6 Issue 3, p33001-33001, 1p