Zobrazeno 1 - 10
of 58
pro vyhledávání: '"Christophe Rousselot"'
Autor:
Wael Hourani, Christophe Rousselot, Kouamé Boko Joël-Igor N’Djoré, Alain Billard, Mohammad Arab Pour Yazdi, Younes Makoudi
Publikováno v:
Electronic Materials, Vol 3, Iss 4, Pp 291-300 (2022)
Lanthanum manganite (LMO) thin films were deposited by co-sputtering La and Mn targets in an Ar and O2 gas mixture. The films were synthesized on silicon and fused silica substrates. The influences of thermal annealing on the structure, optical and e
Externí odkaz:
https://doaj.org/article/ba5321ae9d3f4dbfb57fbcd2731a2446
Autor:
Mehdi Zaoui, Alexandre Bourceret, Yves Gaillard, Sylvain Giljean, Christophe Rousselot, Marie-José Pac, Fabrice Richard
Publikováno v:
Acta Polytechnica CTU Proceedings, Vol 27, Iss 0, Pp 79-83 (2020)
This study aims to model, by using a finite element method, the relationship between the hardness and the period Λ of metal/nitride multilayer coatings (Ti0.54Al0.46/Ti0.54Al0.46N)n in order to understand the increase of the hardness at the low peri
Externí odkaz:
https://doaj.org/article/618ff670270742e7a5c531757d6783a8
Autor:
Moussa Grafoute, Kouamé Boko Joël-Igor N’Djoré, Carine Petitjean, Jean François Pierson, Christophe Rousselot
Publikováno v:
Coatings; Volume 12; Issue 8; Pages: 1050
Fe-O-N films were successfully deposited by magnetron sputtering of an iron target in Ar-N2-O2 reactive mixtures at high nitrogen partial pressure 1.11 Pa (Q(N2) = 8 sccm) using a constant flow rate of argon and an oxygen flow rate Q(O2) varying from
Autor:
M.-J. Pac, Sylvain Giljean, Alexandre Bourceret, Mehdi Zaoui, Christophe Rousselot, Fabrice Richard, Yves Gaillard
Publikováno v:
Acta Polytechnica CTU Proceedings, Vol 27, Iss 0, Pp 79-83 (2020)
This study aims to model, by using a finite element method, the relationship between the hardness and the period Λ of metal/nitride multilayer coatings (Ti0.54Al0.46/Ti0.54Al0.46N)n in order to understand the increase of the hardness at the low peri
Autor:
Christophe Rousselot
Publikováno v:
SSRN Electronic Journal.
Autor:
Kouamé Boko Joël-Igor N’Djoré, Moussa Grafouté, Younes Makoudi, Waël Hourani, Christophe Rousselot
Publikováno v:
Coatings; Volume 12; Issue 2; Pages: 274
Tungsten oxide films are deposited onto glass and silicon substrates using reactive magnetron sputtering. Several studies have revealed difficulties in studying the electrical properties of resistive WOx films. The main objective of this work is to p
Publikováno v:
Journal of Synchrotron Radiation. 22:1440-1449
Titanium and aluminium nitride films deposited by magnetron sputtering generally grow as columnar domains made of oriented nanocrystallites with cubic or hexagonal symmetry depending on Al content, which are embedded in more disordered grain boundari
Autor:
A. Diama, Carine Petitjean, Jean-François Pierson, Christophe Rousselot, Jean-Marc Greneche, M. Grafouté
Publikováno v:
Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2015, 272, pp.158-164. ⟨10.1016/j.surfcoat.2015.04.010⟩
Surface and Coatings Technology, Elsevier, 2015, 272, pp.158-164. ⟨10.1016/j.surfcoat.2015.04.010⟩
International audience; Multilayered Fe-O-N films were deposited on glass and silicon substrates using reactive magnetron sputtering with a reactive gas pulsing process. The argon and nitrogen flow rates were kept constant during sputtering of a pure
Autor:
Yaroslav Odarchenko, Corinne Ulhaq-Bouillet, M.-H. Tuilier, Christophe Rousselot, Ovidiu Ersen, Y. Pinot, M.-J. Pac, Dimitri A. Ivanov, P. Henry
Publikováno v:
Thin Solid Films. 577:74-81
The properties at different scales of Ti1 − xAlxN films deposited by reactive magnetron sputtering from TiAl sintered (S) targets produced by powder metallurgy are compared with those of a set of films previously deposited in the same conditions fr
Autor:
Y. Pinot, Christophe Rousselot, Sylvain Giljean, Patrick Delobelle, M.-H. Tuilier, M.-J. Pac, Corinne Ulhaq-Bouillet
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2017, 634, pp.96-106
Thin Solid Films, Elsevier, 2017, 634, pp.96-106
International audience; Physical vapour deposition technology iswell suited to the deposition of advanced TiAlN-based coatings. Among these thin films, multilayer systems consisting of stacked layers of metallic Ti1−xAlx and nitride Ti1−xAlxNwith
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::339a316a0a79a4181d4f45e868202704
https://hal.archives-ouvertes.fr/hal-02131468
https://hal.archives-ouvertes.fr/hal-02131468