Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Christophe Lorant"'
Autor:
Zheng Tao, Yisuo Li, Waikin Li, Minsoo Kim, Basoene Briggs, Katia Devriendt, Lieve Teugels, Farid Sebaai, Christophe Lorant, Clement Porret, Erik Rosseel, Alfonso Sepúlveda Márquez, Nicolas Jourdan, Juergen Boemmels, Jerome Mitard, Philippe Matagne, Efrain Altamirano-Sánchez, Lars-Ake Ragnarsson, Anish Dangol, Dmitry Batuk, Gerardo Tadeo Martinez Alanis, Jef Geypen, Kenichi Kanazawa, Testuo Izawa, Masakazu Kakumu, Koji Sakui, Nozomu Harada
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b27940f86043989bbeb292960c97101a
https://doi.org/10.1117/12.2614772
https://doi.org/10.1117/12.2614772
Autor:
Anshul Gupta, Zheng Tao, Dunja Radisic, Hans Mertens, Olalla Varela Pedreira, Steven Demuynck, Juergen Boemmels, Katia Devriendt, Nancy Heylen, Shouhua Wang, Karine Kenis, Lieve Teugels, Farid Sebaai, Christophe Lorant, Nicolas Jourdan, Boon Teik Chan, Sujith Subramanian, Filip Schleicher, Antony Peter, Nouredine Rassoul, Yong Kong Siew, Basoene Briggs, Dasiy Zhou, Erik Rosseel, Elena Capogreco, Geert Mannaert, Alfonso Sepúlveda Márquez, Emmanuel Dupuy, Kevin Vandersmissen, Bilal Chehab, Gayle Murdoch, Efrain Altamirano-Sánchez, Serge Biesemans, Zsolt Tokei, Eugenio Dentoni Litta, Naoto Horiguchi
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4e39fa928e22ebd2961927d5db215ec
https://doi.org/10.1117/12.2615641
https://doi.org/10.1117/12.2615641
Autor:
Stefan Decoster, Els Kesters, Amir-Hossein Tamaddon, Frederic Lazzarino, Victor M. Blanco Carballo, Diziana Vangoidsenhoven, Christophe Lorant
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
While the semiconductor industry has reached the high-volume manufacturing of the 7 nm technology node (N7), patterning processes for future technology nodes N5, N3 and even below, are being investigated and developed by research centers. To achieve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02bd7d175a07053eda2baa0fdc21ded1
https://doi.org/10.1117/12.2515173
https://doi.org/10.1117/12.2515173
Autor:
SungEun Hong, Elizabeth Wolfer, Geert Mannaert, Huirong Yao, Joon Yeon Cho, Munirathna Padmanaban, Douglas Mckenzie, Toby Hopf, Claire Petermann, Salem K. Mullen, Farid Sebaai, Christophe Lorant, Diziana Vangoidsenhoven, Alberto D. Dioses, Efrain Altamirano Sanchez, Dalil Rahman, Danilo De Simone
Publikováno v:
Journal of Photopolymer Science and Technology. 29:59-67
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7a32daf272796759c51a8ba78878931
https://doi.org/10.2494/photopolymer.29.59
https://doi.org/10.2494/photopolymer.29.59
Autor:
Christophe Lorant, Douglas Mckenzie, Toby Hopf, Huirong Yao, Farid Sebaai, Daniele Piumi, Efrain Altamirano-Sánchez, Claire Petermann, Salem K. Mullen, Dalil Rahman, Elizabeth Wolfer, Joonyeon Cho, Geert Mannaert, Munirathna Padmanaban, SungEun Hong
Publikováno v:
SPIE Proceedings.
There is a growing interest in new spin on metal oxide hard mask materials for advanced patterning solutions both in BEOL and FEOL processing. Understanding how these materials respond to plasma conditions may create a competitive advantage. In this
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::016c6d3faa2e60fab7edd640f01276c4
https://doi.org/10.1117/12.2264323
https://doi.org/10.1117/12.2264323
Publikováno v:
Journal of Physics D: Applied Physics, Vol. 50, no.13, p. 135202 (2017)
In atmospheric-pressure plasma reactors, the flow dynamics can be complex, determine the reactor performance and complicate scale-up. Coupling computational fluid dynamics to the calculation of the electric field and plasma chemistry is challenging b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c3fbe0079d343d791fec325ae2f45977
https://hdl.handle.net/2078.1/183135
https://hdl.handle.net/2078.1/183135
Autor:
Eugenio Dentoni Litta, Romain Ritzenthaler, Tom Schram, Alessio Spessot, Barry O’Sullivan, Vladimir Machkaoutsan, Pierre Fazan, Yunhyuck Ji, Geert Mannaert, Christophe Lorant, Farid Sebaai, Arame Thiam, Monique Ercken, Steven Demuynck, Naoto Horiguchi
Publikováno v:
Japanese Journal of Applied Physics; Apr2018, Vol. 57 Issue 4S, p1-1, 1p
Publikováno v:
Journal of Physics D: Applied Physics; 4/5/2017, Vol. 50 Issue 13, p1-1, 1p