Výsledky vyhledávání - "Christophe DEFRANOUX"

Optical characterization of the coloration process in electrochromic amorphous and crystalline WO3 films by spectroscopic ellipsometry

Autor: Guangzhong Yuan, Chenzheng Hua, Chenlu Song, Christophe Defranoux, Yong Liu, Peter Basa, Gaorong Han, Li Huang

Publikováno v: Applied Surface Science. 421:630-635

Amorphous and crystalline electrochromic WO3 films exhibit quite different optical properties during coloration process. In the present work, amorphous and crystalline electrochromic WO3 films prepared by a solution method were characterized using X-

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ba7509587379fcf1a2dfb2e55b48e8cd
https://doi.org/10.1016/j.apsusc.2016.10.176

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Study of annealing effects upon the optical and electrical properties of SnO2:F/SiCxOy low emissivity coatings by spectroscopic ellipsometry

Autor: Chenlu Song, Gaorong Han, Christophe Defranoux, Kangkai Wang, Peter Basa, Cheng Bo, Yong Liu, Bin Wu

Publikováno v: Thin Solid Films. 571:720-726

A non-destructive approach to investigate the annealing effects on the optical and electrical properties of SnO2:F/SiCxOy low emissivity (Low-E) films via spectroscopic ellipsometry has been established. Using a four-layer model for the SnO2:F/SiCxOy

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::cdb3a0f12aec87a83427d02d766ca108
https://doi.org/10.1016/j.tsf.2013.11.029

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Inkjet-printed vertically emitting solid-state organic lasers

Autor: Sébastien Forget, Sébastien Sanaur, Christophe Defranoux, Sébastien Chénais, Oussama Mhibik

Publikováno v: Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2016, 119, pp.173101. ⟨10.1063/1.4946826⟩

International audience; In this paper, we show that Inkjet Printing can be successfully applied to external-cavity vertically-emitting thin-film organic lasers, and can be used to generate a diffraction-limited output beam with an output energy as hi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::251d8896412c17c3fedb299db68e1285
http://arxiv.org/abs/1605.07756

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Pulsed Plasma Deposition from Vinyltrimethylsilane/Oxygen Mixtures

Autor: Fabio Palumbo, Christophe Defranoux, Riccardo d'Agostino, Adriano Francescangeli

Publikováno v: Plasma processes and polymers
6 (2009): 132–138. doi:10.1002/ppap.200800066
info:cnr-pdr/source/autori:A Francescangeli; F Palumbo; R d'Agostino; C Defranoux/titolo:Pulsed Plasma Deposition from Vinyltrimethylsilane%2FOxygen Mixtures/doi:10.1002%2Fppap.200800066/rivista:Plasma processes and polymers (Print)/anno:2009/pagina_da:132/pagina_a:138/intervallo_pagine:132–138/volume:6

In this work, SiO 2 -like films have been deposited in a capacitive coupled parallel plate reactor using low pressure, pulsed O 2 /VTMS plasmas. The influence of the duty cycle and of the period on the structure of films at fixed gas feed composition

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::90be92d82cc385ab3e57991f34bae6f3
https://doi.org/10.1002/ppap.200800066

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Review of Characterization of ZnO by Spectroscopic Ellipsometry

Autor: Alexis Bondaz, Christophe Defranoux, Laurent Kitzinger

Publikováno v: ECS Transactions. 16:33-40

Spectroscopic Ellipsometric (SE) is a non contact, non destructive optical characterization technique which allows the precise determination of the refractive indices and thicknesses of thin films. Very sensitive to any optical contrast, S.E. is now

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::df81763a74004c16445dd02c78605183
https://doi.org/10.1149/1.2985841

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Ellipsometric Porosimetry: Fast and Non Destructive Technique for Characterization of Porous Low-K; Highlights on Plasma Damage and Water Effect on Treated Materials

Autor: Laurent Kitzinger, Alexis Bourgeois, Alexis Bondaz, Christophe Defranoux

Publikováno v: ECS Transactions. 16:221-229

Ellipsometric porosimetry (EP) is a non contact, non destructive approach based on a spectroscopic ellipsometric measurement which allows the precise determination of the refractive indices and thicknesses of the porous films. EP combined spectroscop

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::14a3ff581559e442a05d5ccad153552f
https://doi.org/10.1149/1.2982559

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Optical properties of NiCrO x thin films

Autor: Joël De Coninck, Corinne Nouvellon, Nora Dahmouchène, Michel Voué, Christophe Defranoux, Jean-Louis P. Stehle

Publikováno v: physica status solidi c. 5:1145-1149

The optical properties of thin NiCrOx layers were investigated by spectroscopic ellipsometry (SE). The layers were coated on float glass by magnetron sputtering at different oxygen partial pressures (20% to 30% oxygen in the sputtering gas) and the i

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d20090d576cde57318d6da44549b2726
https://doi.org/10.1002/pssc.200777780

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Fast and Non Destructive Technique to Characterize Thin Film Porosity: Example on Cubic Mesoporous TiO2 Thins Films

Autor: Antonin Moreau, M.O. Martin, Christophe Defranoux, Alexis Bourgeois, Jean-Philippe Piel

Publikováno v: Materials Science Forum. :2183-2186

Spectroscopic ellipsometry is the technique of choice to characterize thickness and refractive indices of transparent and semi-transparent thin layers with thickness ranging from few Angstroms to few micrometers. However, in case of porous thin film,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::03bbe7f99adf92e5a1d59e808d33eba6
https://doi.org/10.4028/www.scientific.net/msf.561-565.2183

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In Situ Phosphorus Doping of Germanium by APCVD

Autor: Brigitte Parmentier, Gabriela Dilliway, Benny Van Daele, Olivier Richard, Eddy Simoen, Ruud Van Den Boom, Hugo Bender, Frederik Leys, Marc Meuris, Trudo Clarysse, Christophe Defranoux, A. Benedetti, Alain Moussa

Publikováno v: ECS Transactions. 3:599-609

The in-situ fabrication of rectangular concentration-depth profiles of phosphorus in germanium, with electrically active concentrations approaching 1020 cm-3 is reported. The growth method is atmospheric chemical vapor deposition using germane and ph

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::fea5b8ad6a603559bf8b726396f85c07
https://doi.org/10.1149/1.2355857

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X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface

Autor: Thierry Conard, R.G. Vitchev, Hugo Bender, Christophe Defranoux, Jean-Jacques Pireaux, J Wolstenholme

Publikováno v: Applied Surface Science. 235:21-25

Ultra thin Al2O3 and HfO2 films (UP to similar to6 nm) were deposited on SiO2/Si wafers by atomic layer chemical vapour deposition (ALCVD(TM,1)) and studied by exsitu X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry (SE). The thi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::715f9ac6849ba272ab93a0b1bb7b1838
https://doi.org/10.1016/j.apsusc.2004.05.135

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