Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Christina Deverich"'
Publikováno v:
SPIE Proceedings.
Excessive dark loss has been observed along the edge nearest the lid of aged chemically amplified resist blanks, which was traced to organic acid contamination evolving from the acrylic plastic lid of the shipping box. Thermal Gravimetric Analysis (T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d6f3de7470ad5e802e1026c27f608f6
https://doi.org/10.1117/12.632223
https://doi.org/10.1117/12.632223
Publikováno v:
SPIE Proceedings.
Resist heating has been known to be one of the main contributors to local CD variation in mask patterning using variable shape e-beam tools. Increasingly complex mask patterns require increased number of shapes which drives the need for higher electr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e1806cab02a165abdf2184aade533cd
https://doi.org/10.1117/12.517513
https://doi.org/10.1117/12.517513
Autor:
Robert Lang, Wayne M. Moreau, David R. Medeiros, Christina Deverich, Arpan P. Mahorowala, Wenjie Li, Wei He, Marie Angelopoulos, Karen Petrillo, Paul A. Rabidoux, Chester Huang, Wu-Song Huang
Publikováno v:
SPIE Proceedings.
The mask fabrication industry is slowly migrating to chemically amplified (CA) resists to take the advantages of their high contrast, resolution, and sensitivity. During this migration process, the industry has encountered several problems associated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18991d5d6696d56d2ba8073b1522fa51
https://doi.org/10.1117/12.504049
https://doi.org/10.1117/12.504049
Autor:
Marie Angelopoulos, David R. Medeiros, Dario L. Goldfarb, Thomas J. Cardinali, Christina Deverich, J.J. Bucchignano, Wu-Song Huang, Wayne M. Moreau, Karen Petrillo, Chester Huang, Robert Lang
Publikováno v:
SPIE Proceedings.
KRS-XE, a high performance chemically amplified photoresist designed specifically for e-beam mask making applications, has been enhanced to achieve reduced “footing” on chrome oxide surfaces while still maintaining the original lithographic chara
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbfb2d5fe764629c45b3c85404ef8a5e
https://doi.org/10.1117/12.468085
https://doi.org/10.1117/12.468085
Autor:
Paul A. Rabidoux, William A. Aaskov, Karen Petrillo, Christina Deverich, Peter Levin, Wu-Song Huang, Wayne M. Moreau, Andrew J. Watts, David Madeiros, Thomas J. Cardinali, Marie Angelopoulos
Publikováno v:
SPIE Proceedings.
KRS-XE is a chemically amplified resist developed to enable electron-beam lithography for mask making at the 100nm node. This material has been shown to provide an excellent process window for mask manufacturing at this node. Characterization of this
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a57036ce0f89acb62cb8260a01dcdc6b
https://doi.org/10.1117/12.476946
https://doi.org/10.1117/12.476946
Autor:
Karen Petrillo, David R. Medeiros, Barbara Bates Peck, Wu-Song Huang, Christina Deverich, Brian Ashe, Marie Angelopoulos, Wayne M. Moreau, Paul A. Rabidoux
Publikováno v:
21st Annual BACUS Symposium on Photomask Technology.
The traditional mask making process uses chain scission-type resists such as PBS, poly(butene-1-sulfone), and ZEP, poly(methyl a-chloroacrylate-co-a-methylstyrene) for making masks with dimensions greater than 180nm. PBS resist requires a wet etch pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1157c4d791d3526dde533ac6b0ba2059
https://doi.org/10.1117/12.458348
https://doi.org/10.1117/12.458348