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pro vyhledávání: '"Christina Ann Rathman"'
Autor:
Jeffrey M. Lauerhaas, Chimaobi W. Mbanaso, Jeffery W. Butterbaugh, Antonio L. P. Rotondaro, Derek W. Bassett, Gregory P. Thomes, Christina Ann Rathman, Brent D. Schwab
Publikováno v:
2019 China Semiconductor Technology International Conference (CSTIC).
Cryogenic Nano-Aerosol dry cleaning is an enabling technology for defect removal on substrates where wet cleaning techniques are not practical or are difficult to implement [1–4]. Example substrates are hydrophobic low-k films, films containing cor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df5b20e0d64e93d088a54e2ae1c2b878
https://doi.org/10.1109/cstic.2019.8755703
https://doi.org/10.1109/cstic.2019.8755703
