Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Christian Ziener"'
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI.
This paper describes the successful combination of masking or beam shaping elements based on thin membranes with the thermally ultra-stable properties of the ULE [1] glass substrate material. These kind of elements can be used in transmission in the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::38f4eb36ca7bdaf1c8a57ebe8b18f192
https://doi.org/10.1117/12.2551869
https://doi.org/10.1117/12.2551869
Autor:
Masaki Yoshioka, Max C. Schürmann, Guido Hergenhan, Christian Ziener, Guido Schriever, Denis Bolshukhin, Jürgen Dr. Kleinschmidt, Vladimir Dr. Korobochko, Chinh Duc Prof. Tran
Publikováno v:
SPIE Proceedings.
EUVL source development at XTREME technologies benefits from the learning gained in previous developments for EUV Micro Exposure and Alpha Tools. Field data available from operation of these tools represent the basis for continuous improvement in cor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d11791f016e6149bd9adfefa9c2773ff
https://doi.org/10.1117/12.772830
https://doi.org/10.1117/12.772830
Autor:
Jürgen Dr. Kleinschmidt, Max C. Schürmann, Masaki Yoshioka, Guido Schriever, Vladimir M. Borisov, Uwe Stamm, Guido Hergenhan, Christian Ziener
Publikováno v:
SPIE Proceedings.
Xenon-fueled gas discharge produced plasma (DPP) sources were integrated into Micro Exposure Tools already in 2004. Operation of these tools in a research environment gave early learning for the development of EUV sources for Alpha and Beta-Tools. Fu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::332d58dbd40481965ad8ca1fff357f3d
https://doi.org/10.1117/12.712136
https://doi.org/10.1117/12.712136
Autor:
Klaus Bergmann, Joseph Pankert, Willi Neff, Bernhard Jagle, Juergen Kleinschmidt, Uwe Stamm, Andre Egbert, Christian Ziener, Vivek Bakshi, Guido Schriever, Rainer Lebert, Christian Wies, Marc Corthout, Deborah Gustafson
Publikováno v:
23rd European Mask and Lithography Conference.
Extreme ultraviolet lithography (EUVL) is the leading technology for patterning at the 32 nm technology node and be-yond. EUVL light at 13.5 nm is used to print circuits. This light is produced by heating fuel (Xe, Sn) in EUV sources to a very high t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d84d001f9b62ec4d371095711051f81b
https://doi.org/10.1117/12.737183
https://doi.org/10.1117/12.737183
Autor:
Vladimir Dr. Korobochko, Bjoern Mader, Kai Gaebel, Juergen Kleinschmidt, Henry Birner, Guido Hergenhan, Jesko Dr. Brudermann, Sven Goetze, Denis Bolshukhin, Uwe Stamm, Imtiaz Ahmad, Diethard Kloepfel, Guido Schriever, Frank Flohrer, Rainer Mueller, Tran Duc Chinh, Christian Ziener, Jens Ringling
Publikováno v:
High-Power Laser Ablation V.
The availability of extreme ultraviolet (EUV) light sources, measurement tools and integrated test systems is of major importance for the development of EUV lithography for use in high volume chip manufacturing which is expected to start in 2009. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::097b00202bce4b9e309d1da2e1a34eff
https://doi.org/10.1117/12.548385
https://doi.org/10.1117/12.548385
Autor:
Juergen Kleinschmidt, Tran Duc Chinh, Guido Hergenhan, Guido Schriever, Vladimir Korobotchko, Sven Goetze, Henry Birner, Imtiaz Ahmad, Rainer Mueller, Jens Ringling, Christian Ziener, Frank Flohrer, Uwe Stamm, Diethard Kloepfel, Björn Mader, Kai Gaebel, Denis Bolshukhin, Jesko Dr. Brudermann
Publikováno v:
SPIE Proceedings.
Semiconductor chip manufacturers are expecting to use extreme ultraviolet (EUV) lithography for high volume manufacturing of DRAMs and ICs starting by the end of this decade. Among all the technologies and modules which have to be developed EUV sourc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a620b775326f27a8daf5d146b1880766
https://doi.org/10.1117/12.535410
https://doi.org/10.1117/12.535410
Autor:
Volker Herold, Jeremy Wellen, Christian Ziener, Thomas Weber, Karl-Heinz Hiller, Peter Nordbeck, Eberhard Rommel, Axel Haase, Wolfgang Bauer, Peter Jakob, Susanta Sarkar
Publikováno v:
MAGMA: Magnetic Resonance Materials in Physics, Biology & Medicine; Jun2009, Vol. 22 Issue 3, p159-166, 8p