Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition

Autor: Jing-Jia Huang, Christian Militzer, Charles A. Wijayawardhana, Urban Forsberg, Henrik Pedersen

Publikováno v: Journal of Vacuum Science & Technology A. 41

In this work, silicon carbide coatings (SiC) were successfully grown by pulsed chemical vapor deposition (CVD). The precursors silicon tetrachloride (SiCl4) and ethylene (C2H4) were not supplied in a continuous flow, but were pulsed alternately into

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::27957a66522255f3537de8a809fc48bd
https://doi.org/10.1116/6.0002461

Controlled CVD growth of highly <111>-oriented 3C-SiC

Autor: Jing-Jia Huang, Christian Militzer, Charles Wijayawardhana, Urban Forsberg, Lars Ojamäe, Henrik Pedersen

Highly -oriented 3C-SiC coatings with distinct surface morphology consisting of hexagonally shaped pyramidal crystals were prepared by chemical vapor deposition (CVD) using silicon tetrachloride (SiCl4) and toluene (C7H8) at T ≤ 1250 ℃ and p = 10

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::18e7aa4d4307561e1da94eed311e1b07
https://doi.org/10.26434/chemrxiv-2022-0z38x

Atomic layer deposition onto fabrics of carbon and silicon carbide fibers: Preparation of multilayers comprising alumina, titania-furfuryl alcohol hybrid, and titanium phosphate

Autor: Werner A. Goedel, Florian Pachel, Christoph Tegenkamp, Stefan Knohl, Walter Krenkel, Christian Militzer, Alex Held, Pauline Dill, Georg Puchas

Publikováno v: Journal of Vacuum Science & Technology A. 39:052406

High temperature-resistant fabrics can be used as a reinforcement structure in ceramic matrix composites. They often need a coating for oxidation protection and mechanical decoupling from the matrix. Atomic layer deposition (ALD) provides very thin c

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3f73761ce3b8bfd2d09cb1a06c861cf9
https://doi.org/10.1116/6.0001193

Review article: recommended reading list of early publications on atomic layer deposition - outcome of the 'virtual Project on the History of ALD'

Autor: Riikka L. Puurunen, Mikhail Chubarov, Tommi Kääriäinen, Cheol Seong Hwang, Çaǧla Özgit-Akgün, Geert Rampelberg, Erwan Rauwel, Rong Chen, Anjana Devi, David Campbell Cameron, Thomas E. Seidel, Jussi Lyytinen, Liliya Elnikova, A. A. Malkov, Markku Leskelä, Georgi Popov, Henrik Pedersen, Tanja Kallio, A. Outi I. Krause, Jaana Kanervo, Jakob Kuhs, Tobias Törndahl, Gloria Gottardi, A. A. Malygin, Nathanaelle Schneider, Fred Roozeboom, Małgorzata Norek, Marja-Leena Kääriäinen, Adam A. Łapicki, Dohan Kim, Irina Kärkkänen, Fabien Piallat, Harri Lipsanen, Esko Ahvenniemi, Oili Ylivaara, Lev Klibanov, Jyrki Molarius, Claudia Wiemer, Shih Hui Jen, J. Ruud van Ommen, Andrew R. Akbashev, Kestutis Grigoras, Dmitry Suyatin, Christian Militzer, Yury Koshtyal, Hele Savin, Jonas Sundqvist, Timo Sajavaara, Luca Lamagna, Véronique Cremers, Stefan Ivanov Boyadjiev, Mikhail Panov, Saima Ali, Oksana Yurkevich, Dennis M. Hausmann, Ivan Khmelnitskiy, Hossein Salami, Viktor Drozd, Mikhael Bechelany, Robin H. A. Ras, Abdelkader Mennad, Maria Berdova

Publikováno v: Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films, 35(1)
Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2017, 35 (1), ⟨10.1116/1.4971389⟩
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 35(1):010801, 1-13. AVS Science and Technology Society
Ahvenniemi, E, Akbashev, A, Ali, S, Bechelany, M, Berdova, M, Boyadjiev, S, Cameron, D, Chen, R, Chubarov, M, Cremers, V, Devi, A, Drozd, V, Elnikova, L, Gottardi, G, Grigoras, K, Hausmann, D, Hwang, C S, Jen, S-H, Kallio, T, Kanervo, J, Khmelnitskiy, I, Kim, D H, Klibanov, L, Koshtyal, Y, Krause, O, Kuhs, J, Kärkkänen, I, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lapicki, A, Leskelä, M, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Mennad, A, Militzer, C, Molarius, J, Norek, M, Özgit-Akgün, Ç, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R, Rampelberg, G, Ras, R H A, Rauwel, E, Roozeboom, F, Sajavaara, T, Salami, H, Savin, H, Schneider, N, Seidel, T E, Sundqvist, J, Suyatin, D, Törndahl, T, van Ommen, J R, Wiemer, C, Ylivaara, O & Yurkevich, O 2017, ' Review Article: Recommended reading list of early publications on atomic layer deposition : Outcome of the "Virtual Project on the History of ALD" ', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 35, no. 1, 010801 . https://doi.org/10.1116/1.4971389
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2, 35
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A, 2017, 35 (1), ⟨10.1116/1.4971389⟩

Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin c

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fa895b65e04c902eab774083e92e5f89
https://doi.org/10.1116/1.4971389

Front Cover: Discovery of Molidustat (BAY 85-3934): A Small-Molecule Oral HIF-Prolyl Hydroxylase (HIF-PH) Inhibitor for the Treatment of Renal Anemia (ChemMedChem 10/2018)

Autor: Metin Akbaba, Uwe Thuss, Kai Dr. Thede, Gunter Karig, Jörg Keldenich, Friederike Stoll, Hans-Christian Militzer, Ingo Flamme, Mario Jeske, Jens-Kerim Ergüden, Felix Oehme, Ingo Hartung, Hartmut Beck

Publikováno v: ChemMedChem. 13:981-981

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0ddaf8ac9825bcf1279a19664c77a512
https://doi.org/10.1002/cmdc.201800275