Zobrazeno 1 - 10
of 65
pro vyhledávání: '"Christian Laubis"'
Autor:
Vu Luong, Vicky Philipsen, Eric Hendrickx, Karl Opsomer, Christophe Detavernier, Christian Laubis, Frank Scholze, Marc Heyns
Publikováno v:
Applied Sciences, Vol 8, Iss 4, p 521 (2018)
Extreme ultraviolet (EUV) lithography is being industrialized as the next candidate printing technique for high-volume manufacturing of scaled down integrated circuits. At mask level, the combination of EUV light at oblique incidence, absorber thickn
Externí odkaz:
https://doaj.org/article/b0f1a5d806d64779ba1e19566d7153a5
Autor:
Qais Saadeh, Hazem Mesilhy, Victor Soltwisch, Andreas Erdmann, Richard Ciesielski, Leonhard Lohr, Anna Andrle, Vicky Philipsen, Devesh Thakare, Christian Laubis, Frank Scholze, Michael Kolbe
Publikováno v:
Photomask Technology 2022.
Autor:
Marco Barbera, Ugo Lo Cicero, Luisa Sciortino, Michela Todaro, Elena Puccio, Fabio D'Anca, Nicola Montinaro, Salvatore Varisco, Pekka Törmä, Lauri Riuttanen, Ilkka Varjos, Bjorn Mikladal, Elena Magnano, Igor Pis, Christian Gollwitzer, Evelyn Handick, Michael Krumrey, Christian Laubis
Publikováno v:
Space Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray.
In this paper, we present the first results from an investigation performed on nanometric thin pellicles based on carbon nanotubes (CNT) of potential interest for manufacturing large area optical blocking filters to protect soft X-ray detectors in as
Autor:
Qais Saadeh, Philipp Naujok, Devesh Thakare, Meiyi Wu, Vicky Philipsen, Frank Scholze, Christian Buchholz, Zanyar Salami, Yasser Abdulhadi, Danilo Ocaña García, Heiko Mentzel, Anja Babuschkin, Christian Laubis, Victor Soltwisch
Publikováno v:
Optik. 273:170455
ispartof: OPTIK vol:273 status: published
Autor:
Sebastian Heidenreich, Konstantin Nikolaev, Michael Kolbe, Maren Casfor Zapata, Frank Scholze, Christian Laubis, Mika Pflüger, Victor Soltwisch, Nando Farchmin
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
Recent studies for profile reconstructions of nanostructures produced with self-aligned quadruple patterning (SAQP) indicate the limits for solving the inverse problem with a rigorous simulation. Using Monte Carlo methods for the theoretical investig
Autor:
Victor Soltwisch, Anja Schönstedt, Qais Saadeh, Christian Buchholz, Christian Stadelhoff, Anna Andrle, Philipp Naujok, Vicky Philipsen, Philipp Hönicke, Heiko Mentzel, Frank Scholze, Christian Laubis
Publikováno v:
Optics Express. 29:40993
The optical constants of ruthenium in the spectral range 8 nm to 23.75 nm with their corresponding uncertainties are derived from the reflectance of a sputtered ruthenium thin film in the Extreme Ultraviolet (EUV) spectral range measured using monoch
Autor:
Andreas Erdmann, Jens Rip, Philipp Hönicke, Christian Laubis, Laurent Souriau, Eric Hendrickx, Peter Evanschitzky, Christophe Detavernier, Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Victor Soltwisch
Publikováno v:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
In next-generation EUV imaging for foundry N5 dimensions and beyond, inherent pitch- and orientation-dependent effects on wafer level will consume a significant part of the lithography budget using the current Ta-based mask. Mask absorber optimizatio
Autor:
Annett Barboutis, Ayhan Babalik, Jana Puls, Christian Stadelhoff, Anja Schönstedt, Jana Lehnert, Claudia Tagbo, Christian Laubis, Michael Sintschuk, Anja Babuschkin, Heiko Mentzel, Andreas Fischer, Frank Scholze, Christian Buchholz, Sina Jaroslawzew
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
For EUV-lithography, reliable measurements of the radiant power throughout the optical chain are an essential requirement for the optimization of the lithographic production process as well as for the development of new applications like EUV-based me
Autor:
Vu Luong, Christophe Detavernier, Marc Heyns, Christian Laubis, Vicky Philipsen, Karl Opsomer, Frank Scholze, Jens Rip, Eric Hendrickx
Publikováno v:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Tellurium (Te) is one of the elements with highest extinction coefficient lc at the 13.5 nm extreme-ultraviolet (EUV) wavelength. It is being considered as an alternative absorber material for binary photomasks in EUV lithography. The absorber materi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8274d32c3dbf36f763d115cdae99c0b0
https://biblio.ugent.be/publication/8661503/file/8661517
https://biblio.ugent.be/publication/8661503/file/8661517
Autor:
Claudia Tagbo, Victor Soltwisch, Christian Laubis, Frank Scholze, Christian Buchholz, Andreas Fischer
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
The introduction of EUV lithography into high volume manufacturing poses new challenges to any optical component in the lithography machines. Particularly the homogeneity of the optical properties is of importance. The present measurement capabilitie