Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Christian Chovino"'
Publikováno v:
Designed Monomers and Polymers. 3:55-66
A new type of cationic polyelectrolyte with poly(ethylene oxide) (PEO) side-chains has been prepared by the spontaneous polymerization of 4-vinylpyridine in the presence of PEO monotosylates or bromides. This very easy anionic polymerization method g
Autor:
Philippe Gramain, Christian Chovino
Publikováno v:
Polymer. 40:4805-4810
A series of poly(4-vinylpyridinium salts) was prepared by spontaneous polymerization of 4-vinylpyridine in the presence of various alkylating agents and at different temperatures in order to study by 1H-NMR the stereoregularity of the obtained polysa
Publikováno v:
Polymer. 39:6385-6390
In order to study the tacticity effect of the backbone on the thermotropic properties of side-chain liquid crystalline (SCLC) polymers, the synthesis of four polymethacrylates with different tacticities and bearing methoxy biphenyl mesogenic groups w
Autor:
Philippe Gramain, Christian Chovino
Publikováno v:
Macromolecules. 31:7111-7114
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 35:2569-2577
In order to demonstrate the important smectic power of the ionic functions present in mesogenic molecules, a series of N-alkylpyridinium bromides ω-substituted with (4-cyanobiphenylyl)oxy or [4-(2-methyl-1-butoxy)biphenylyl]oxy mesogenic group and t
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 35:2719-2728
A new type of single-ion conductor with fixed cation was synthesized by spontaneous anionic polymerization of 4-vinylpyridine in the presence of short polyethylene oxide (PEO) chains as alkylating agents. These comblike polymers have low Tgs and are
Autor:
Christian Chovino, Philippe Gramain
Publikováno v:
Macromolecular Chemistry and Physics. 197:1411-1418
Poly(methacryloyl chloride) (PMACI) and poly(methacrylic tetramethylammonium salts and poly(methacrylic tetraethyl ammonium salts) (PMAAN + ) have been prepared by radical photopolymerization at different temperatures. The obtained molecular weights
Autor:
Jeroen Huijbregtse, Joseph S. Gordon, Christian Chovino, Brid Connolly, Marianna Silova, Colleen Weins, Larry E. Frisa, Nicolae Maxim
Publikováno v:
25th European Mask and Lithography Conference.
Advanced photolithography tools use 193 nanometer wavelength light for conventional and immersion printing. The increased energy of 193 nm (ArF) light coupled with the higher absorption cross section of most materials has lead to a dramatic increase
Publikováno v:
SPIE Proceedings.
While significant progress has been made in reducing the occurrence rate of progressive defect growth on photomasks used at 193nm, the issue continues to be a problem for many semiconductor fabs. Increasing evidence from multiple sources indicates th
Autor:
Steve Mahoney, David Chan, John Keagy, Colleen Weins, Makoto Kozuma, Larry E. Frisa, Joseph Gordon, Christian Chovino, Frank F. Chen, Takahiro Matsuura, Kyoko Kuroki
Publikováno v:
SPIE Proceedings.
With the use of 193nm lithography, haze growth has increasingly become a critical issue for photomask suppliers and wafer fabs. Recent photomask industry surveys indicate the occurrence rate of haze is 10 times higher on 193nm masks compared to 248nm