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pro vyhledávání: '"Christian Capella"'
Autor:
Christian Chovino, Prakash Krishnan, Laurent Dieu, Julio Reyes, Dianna Coburn, Eric Johnstone, Christian Capella, Dongsung Hong
Publikováno v:
SPIE Proceedings.
The integration of 193nm Lithography is close to full production for the 90nm node technology and shows potential for lithographic resolution down to the 65nm node. The quality of 193nm reticles including binary, EAPSM and AAPSM must be outstanding s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a91bb3e007fe2b95a23c1523f8950fe7
https://doi.org/10.1117/12.518262
https://doi.org/10.1117/12.518262
