Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Christian Buergel"'
Autor:
Sandra Hecker, Christian Buergel, Florian Werle, Paul Ackmann, Nan Fu, Stefan Roling, Guoxiang Ning
Publikováno v:
SPIE Proceedings.
Implant layers must cover both logic and SRAM devices with good fidelity even if feature density and pitch differ very much. The coverage design rules of implant layers for SRAM and logic to active layer can vary. Lithography targeting could be probl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f467b853d18e6d48fc16871d9de2a5af
https://doi.org/10.1117/12.2197195
https://doi.org/10.1117/12.2197195
Autor:
Edita Tejnil, John L. Sturtevant, Fritz Gans, Paul Ackmann, Kent H. Nakagawa, Ana Armeanu, Michael Lam, Peter Buck, Guoxiang Ning, Christian Buergel, Kostas Adam, Franklin D. Kalk, Steffen Schulze, Michael Oliver, David Fryer, Chris Clifford
Publikováno v:
SPIE Proceedings.
This study quantifies the impact of systematic mask errors on OPC model accuracy and proposes a methodology to reconcile the largest errors via calibration to the mask error signature in wafer data. First, we examine through simulation, the impact of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2fc9508d6ac2ab1012c0674a5d33285
https://doi.org/10.1117/12.2066483
https://doi.org/10.1117/12.2066483
Autor:
Peter Buck, Guoxiang Ning, Franklin D. Kalk, Kent H. Nakagawa, Steffen Schulze, Christian Buergel, John L. Sturtevant, Fritz Gans, Paul Ackmann, Edita Tejnil
Publikováno v:
SPIE Proceedings.
Computational lithography solutions rely upon accurate process models to faithfully represent the imaging system output for a defined set of process and design inputs. These models rely upon the accurate representation of multiple parameters associat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::440d42cdef13301ff55e6e2c6ac0b422
https://doi.org/10.1117/12.2030733
https://doi.org/10.1117/12.2030733
Autor:
Frank Richter, Fang Hong Gn, Stefan Roling, Christian Buergel, Marc Staples, Anthony Zhou, Thomas Thamm, Guoxiang Ning, Andre Leschok, Paul Ackmann, Chin Teong Lim
Publikováno v:
SPIE Proceedings.
Dummy pattern fill is added to a layout of a reticle for the purpose of raising the pattern-density of specific regions. The pattern-density has also an influence on different process-steps which were performed when manufacturing a reticle (e.g. prox
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dcb0cc6d66224f75536667fcb3ba8cc4
https://doi.org/10.1117/12.964375
https://doi.org/10.1117/12.964375
Autor:
Werner Saule, Anatol Schwersenz, Christian Buergel, Marlene Strobl, Peter Dress, Martin Tschinkl
Publikováno v:
SPIE Proceedings.
With shrinking feature sizes there is a growing demand for improved uniformity values and defect levels especially for aqueous develop during photomask processing. Standard nozzle systems with discrete dispense channels for applying the developer med
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9328848673e190ed806f0d484d855086
https://doi.org/10.1117/12.504190
https://doi.org/10.1117/12.504190
Publikováno v:
SPIE Proceedings.
In this contribution we will demonstrate how the use of negative tone CAR can significantly improve the CD control of mask layers in which CD is measured on opaque features. A thorough investigation of the individual contributions of sequential proce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::209b6be3e7a0691093cc4ef5bca6d987
https://doi.org/10.1117/12.467429
https://doi.org/10.1117/12.467429
Autor:
John L. Sturtevant, Kent H. Nakagawa, Fritz Gans, Christian Buergel, Peter Buck, Guoxiang Ning, Steffen Schulze, Paul Ackmann, Edita Tejnil, Timothy Lin, Franklin D. Kalk
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 13:011004
Computational lithography solutions rely upon accurate process models to faithfully represent the imaging system output for a defined set of process and design inputs. These models rely upon the accurate representation of multiple parameters associat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30919c2dcd752da9cdc3229c5597c7d8
https://doi.org/10.1117/1.jmm.13.1.011004
https://doi.org/10.1117/1.jmm.13.1.011004