Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Christelle Dublanche-Tixier"'
Autor:
Laura Renoux, Christelle Dublanche-Tixier, Christophe Chazelas, Pascal Tristant, Patrice Valorge, Corinne Maftah, Patrick Leprat
Publikováno v:
Materials Sciences and Applications. 14:285-298
Publikováno v:
Applied Surface Science
Applied Surface Science, Elsevier, 2019, 493, pp.703-709. ⟨10.1016/j.apsusc.2019.07.057⟩
Applied Surface Science, Elsevier, 2019, 493, pp.703-709. ⟨10.1016/j.apsusc.2019.07.057⟩
An atmospheric pressure plasma-enhanced chemical vapor deposition process using a microwave plasma torch has been used for titania thin film synthesis. A dynamic deposition mode was set up to cover a square centimeter surface with a nanostructured Ti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5dab8b4ae72e231daadb6382754ca744
https://hal-unilim.archives-ouvertes.fr/hal-02475685/document
https://hal-unilim.archives-ouvertes.fr/hal-02475685/document
Autor:
Pascal Tristant, Yoan Gazal, Christophe Chazelas, A. Antoine, Christelle Dublanche-Tixier, Maggy Colas
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2016, 619, pp.137-143. ⟨10.1016/j.tsf.2016.11.010⟩
Thin Solid Films, Elsevier, 2016, 619, pp.137-143. ⟨10.1016/j.tsf.2016.11.010⟩
International audience; This paper reports a rapid and simple method for the co-deposition of TiO2/SiO2 films, using a microwave plasma torch and organometallic precursors. Both structure and microstructure of the films have particularly been investi
Autor:
Christelle Dublanche-Tixier, Sylvain Vedraine, Christophe Chazelas, Pascal Tristant, Amelie Perraudeau, Bernard Ratier
Publikováno v:
EPJ Photovoltaics
EPJ Photovoltaics, EDP sciences, 2019, 10, pp.5. ⟨10.1051/epjpv/2019006⟩
EPJ Photovoltaics, Vol 10, p 5 (2019)
EPJ Photovoltaics, EDP sciences, 2019, 10, pp.5. ⟨10.1051/epjpv/2019006⟩
EPJ Photovoltaics, Vol 10, p 5 (2019)
An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fffcee8217bfaa4e08f42a5c2d2eb9f2
https://hal-unilim.archives-ouvertes.fr/hal-02408015
https://hal-unilim.archives-ouvertes.fr/hal-02408015
Autor:
Karim Benouareth, Cédric Jaoul, Christelle Dublanche-Tixier, Pascal Tristant, Abderrahmane Bouabellou, Christophe Le Niniven, Corinne Nouveau
Publikováno v:
Vacuum
Vacuum, Elsevier, 2016, 125, pp.234-239. ⟨10.1016/j.vacuum.2015.11.002⟩
Vacuum, Elsevier, 2016, 125, pp.234-239. ⟨10.1016/j.vacuum.2015.11.002⟩
International audience; Zirconium thin films were grown on high carbon steel substrates EN C100 (1 %wt. of carbon) by RF magnetron sputtering. In order to study the reactivity of the film/substrate system as a function of the temperature, one hour va
Autor:
Christelle Dublanche-Tixier, Pascal Marchet, Olivier Masson, Joseph Henon, Fabrice Rossignol, Malgorzata Anna Piechowiak, Gregory Etchegoyen, Olivier Durand-Panteix, Bruno Lucas
Publikováno v:
Journal of the European Ceramic Society
Journal of the European Ceramic Society, Elsevier, 2015, 35 (4), pp.1179-1189. ⟨10.1016/j.jeurceramsoc.2014.10.012⟩
Journal of the European Ceramic Society, Elsevier, 2015, 35 (4), pp.1179-1189. ⟨10.1016/j.jeurceramsoc.2014.10.012⟩
A commercial Ti 3 SiC 2 MAX-phase powder of micron size was impacted onto glass substrates by aerosol deposition method (ADM) to get dense and adhesive films without sintering and with thicknesses up to 16 μm. The overall grain organization follows
Autor:
Christelle Dublanche-Tixier, Sofiane Djerraf, S. Hassani, M. Ouchabane, Hadj Lahmar, Siegfried Peter, Mohammed Kechouane
Publikováno v:
SCIENCE OF ADVANCED MATERIALS
SCIENCE OF ADVANCED MATERIALS, 2015, 7 (1), pp.157-162. ⟨10.1166/sam.2015.2096⟩
SCIENCE OF ADVANCED MATERIALS, 2015, 7 (1), pp.157-162. ⟨10.1166/sam.2015.2096⟩
International audience
Autor:
Pascal Tristant, Florent Tetard, Christelle Dublanche-Tixier, Gustavo Sanchez, A. Bologna Alles
Publikováno v:
Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2014, 256, pp.3-8. ⟨10.1016/j.surfcoat.2013.10.067⟩
Surface and Coatings Technology, Elsevier, 2014, 256, pp.3-8. ⟨10.1016/j.surfcoat.2013.10.067⟩
AlN films were prepared with a Microwave Plasma Enhanced Chemical Vapor Deposition reactor at 1 Pa and 700 °C using different radiofrequency bias in order to obtain polycrystalline oriented films with minimal residual stresses for piezoelectric appl
Autor:
Christophe Chazelas, Christelle Dublanche-Tixier, Pascal Tristant, Pierre Carles, Maggy Colas, Yoan Gazal
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2016, 600, pp.43-52. ⟨10.1016/j.tsf.2016.01.011⟩
Thin Solid Films, Elsevier, 2016, 600, pp.43-52. ⟨10.1016/j.tsf.2016.01.011⟩
International audience; In this study, a microwave plasma torch working at atmospheric pressure has been used for TiO2 thin film synthesis. We first optimised the deposition conditions in order to avoid the formation of powder in the plasma phase. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cf843f2fa265b1d06a8ea5e7d603bdce
https://hal-unilim.archives-ouvertes.fr/hal-01875369
https://hal-unilim.archives-ouvertes.fr/hal-01875369
Autor:
Pascal Tristant, Maggy Colas, Cédric Jaoul, O. Jarry, J.M. Jacquet, Thérèse Merle-Méjean, Christelle Dublanche-Tixier
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2009, 518, pp.1475-1479. ⟨10.1016/j.tsf.2009.09.110⟩
Thin Solid Films, Elsevier, 2009, 518, pp.1475-1479. ⟨10.1016/j.tsf.2009.09.110⟩
International audience; Hydrogenated amorphous carbon (a-C:H) films were deposited on flat samples and engine components using an industrial scale reactor. Characterization of the coating allowed validating its application on engine parts due to high