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pro vyhledávání: '"Chris Scholz"'
Autor:
Bruce W. Smith, Burak Baylav, Paul Zimmerman, Chris Scholz, Meng Zhao, Thomas W. Smith, Peng Xie, Ran Yin
Publikováno v:
SPIE Proceedings.
Research has been conducted to develop alternatives to chemically amplified 193 nm photoresist materials that will be able to achieve the requirements associated with sub-32 nm device technology. New as well as older photoresist design concepts for n