Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Chris Keimel"'
Publikováno v:
International Symposium on Microelectronics. 2018:000680-000684
In recent years, advancements in High Performance Computing and Photonics are driving towards high density semiconductor packaging requirements that are creating a need for the adoption of novel material sets. Glass has many attractive properties tha
Publikováno v:
Journal of Materials Research. 29:1597-1608
Extension of microelectromechanical systems (MEMS) into more extreme operating conditions will require a wider range of material properties than are currently available in conventional systems. Successful integration of new materials is dependent on
Publikováno v:
2016 46th European Microwave Conference (EuMC).
This paper details the broadband RF switching challenges in Test and Measurement (T&M) and Automated Test Equipment (ATE) applications, including the need for high performance RF switches capable of 25W. The design, validation and manufacturing of oh
Publikováno v:
IEEE Transactions on Industry Applications. 48:1163-1169
Publikováno v:
Microelectronic Engineering. 83:1547-1550
A new technique for filling narrow and high-aspect ratio nanoscale via holes by laser-assisted direct imprint has been proposed and developed. In the process, the filling material (e.g., metals or Si) is first deposited onto the nano-via holes by a d
Publikováno v:
Applied Physics Letters. 83:4417-4419
We propose and demonstrate a nanopatterning technique, laser-assisted nanoimprint lithography (LAN), in which the polymer is melted by a single excimer laser pulse and then imprinted by a mold made of fused quartz. LAN has been used to pattern nanost
Publikováno v:
2011 IEEE Industrial and Commercial Power Systems Technical Conference.
A new system for switching electrical power using Micro-Electromechanical-Systems (MEMS) is presented. The heart of the system utilizes custom designed MEMS switching device arrays that are able to conduct current more efficiently and can open orders
Publikováno v:
Nature. 417(6891)
The fabrication of micrometre- and nanometre-scale devices in silicon typically involves lithography and etching. These processes are costly and tend to be either limited in their resolution or slow in their throughput. Recent work has demonstrated t
Publikováno v:
Nanotechnology. 21:045303
We report a method of one-step direct patterning of metallic nanostructures. In the method, termed laser assisted direct imprinting (LADI), the surface of a metal film on a substrate is melted by a single excimer laser pulse and subsequently imprinte
Autor:
Azar Alizadeh, Seth T. Taylor, Rosalyn Neander, Lauraine Denault, Harry E. Ruda, I. Saveliev, Marina Blumin, Edit Braunstein, Ken R. Conway, Chris Keimel, Vicki Herzl Watkins, Colin Jones, Christina deSouza, David C. Hays
Publikováno v:
Applied Physics Letters. 94:163112
We report on selective area growth of InAs quantum dots on GaAs substrates patterned with a hexagonal array of 20 nm pores using block copolymer lithography. We discuss the mechanisms of growth, highlighting the variation in the resulting morphology