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pro vyhledávání: '"Chris J. Mackay"'
Autor:
Douglas J. Resnick, Grant Willson, David P. Mancini, John G. Ekerdt, Chris J. Mackay, Sidlgata V. Sreenivasan, Sanjay K. Banerjee, David Onsongo, Nicholas A. Stacey, Britain J. Smith, William J. Dauksher, Kevin J. Nordquist, J. P. Donnelly, Todd Bailey
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (SFIL) is an alternative lithography technique that enables patterning of sub-100 nm features at a cost that has the potential to be substantially lower than either conventional projection lithography or proposed ne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b70ba99ad8605c99823a039aed79335f
https://doi.org/10.1117/12.490142
https://doi.org/10.1117/12.490142
