Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Choong Bong Lee"'
Autor:
Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Benjamin Naab, Choong Bong Lee, Rochelle Rena, Philjae Kang, You Rim Shin, David Limberg, Lei Zhang
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17fb3459f2f31ef8de5c54a764053bc3
https://doi.org/10.1117/12.2659178
https://doi.org/10.1117/12.2659178
Autor:
Charlotte Cutler, James W. Thackeray, Jason DeSisto, Emad Aqad, Tomas Marangoni, Rochelle Rena, James Park, Choong-Bong Lee
Publikováno v:
Journal of Photopolymer Science and Technology. 32:361-366
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::65727c837d54d8817380b35005558427
https://doi.org/10.2494/photopolymer.32.361
https://doi.org/10.2494/photopolymer.32.361
Autor:
Mingqi Li, Chris A. Mack, James W. Thackeray, Tomas Marangoni, Rochelle Rena, John Nelson, Jason DeSisto, Emad Aqad, Choong-Bong Lee, Xisen Hou, Charlotte Cutler, Joshua A. Kaitz
Publikováno v:
Journal of Photopolymer Science and Technology. 31:679-687
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::babe8b098535ffaad827f4e0734ba6e1
https://doi.org/10.2494/photopolymer.31.679
https://doi.org/10.2494/photopolymer.31.679
Autor:
Li Cui, James W. Thackeray, Suzanne Coley, Manibarsha Goswami, Bhooshan C. Popere, Emad Aqad, James F. Cameron, Tomas Marangoni, Choong Bong Lee, Ke Yang
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII.
The development of Chemically Amplified Resists (CARs) for Extreme Ultra-Violet Lithography (EUVL) requires unique molecular and macromolecular design considerations. The combination of photon-induced variation effect coupled with material and proces
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b5da3cfd949d42ba467fe982f7d533b
https://doi.org/10.1117/12.2583642
https://doi.org/10.1117/12.2583642
Autor:
Ke Yang, Amy Kwok, Joshua A. Kaitz, Choong Bong Lee, Ryan Lee, Thomas Cardolaccia, Xisen Hou, Amiel Evans, Mingqi Li
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
To maximize value in integrated circuit manufacturing, semiconductor manufacturers continually seek materials that enable processing with higher throughput and which provide higher yield. 193nm immersion lithography (193i) has been a mainstay in semi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d308a559bafba23deb2dbf646e061712
https://doi.org/10.1117/12.2583735
https://doi.org/10.1117/12.2583735
Autor:
James W. Thackeray, Charlotte Cutler, Peter Trefonas, Choong Bong Lee, Dan B. Millward, Chris A. Mack
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 20
Linewidth roughness (LWR) remains a difficult challenge for improvement in resist materials. We intend to review work that focused on the impact of key components of LWR by analyzing the unbiased power spectral density (PSD) curves. We studied system
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a04ebdf58ee02de07a50ac5ca4ec27df
https://doi.org/10.1117/1.jmm.20.1.010901
https://doi.org/10.1117/1.jmm.20.1.010901
Autor:
John Nelson, Rochelle Rena, James W. Thackeray, Charlotte Cutler, Dan B. Millward, Choong-Bong Lee, Chris A. Mack, Jason DeSisto
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Linewidth Roughness (LWR) remains a difficult challenge in resist materials. In previous work we focused on showing how roughness Power Spectral Density (PSD) parameters were affected by aerial image and basic resist parameters such as diffusion. Thi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98b2dd4350559dd7206169cdf6d55c07
https://doi.org/10.1117/12.2551694
https://doi.org/10.1117/12.2551694
Autor:
Cutler, Charlotte, Choong-Bong Lee, Thackeray, James W., Trefonas, Peter, Nelson, John, DeSisto, Jason, Rena, Rochelle, Mack, Chris
Publikováno v:
Proceedings of SPIE; 1/23/2019, Vol. 10960, p1-19, 19p
Autor:
Cutler, Charlotte, Thackeray, James W., DeSisto, Jason, Nelson, John, Choong-Bong Lee, Mingqi Li, Aqad, Emad, Xisen Hou, Marangoni, Tomas, Kaitz, Joshua, Rena, Rochelle, Mack, Chris
Publikováno v:
Proceedings of SPIE; 1/15/2018, Vol. 10587, p1-11, 11p