Zobrazeno 1 - 10
of 128
pro vyhledávání: '"Chloé Thieuleux"'
Publikováno v:
Inorganics, Vol 12, Iss 3, p 72 (2024)
We report a straightforward alkane elimination strategy to prepare well-defined heterobimetallic Al/Mo species. Notably, the reaction of the monohydride complex of molybdenum, Cp*MoH(CO)3, with triisobutyl aluminum affords a new heterobimetallic [MoA
Externí odkaz:
https://doaj.org/article/3f8f54b370c744d5bce5b8f929ee7309
Autor:
Vincent Dardun, Tania Pinto, Loïc Benaillon, Laurent Veyre, Jules Galipaud, Clément Camp, Valérie Meille, Chloé Thieuleux
Publikováno v:
Dalton Transactions. 52:2157-2163
We describe here a simple protocol yielding small (2Sn nanoparticles (NPs) along with Pd homologues for sake of comparison.
Autor:
Ribal Jabbour, Marc Renom-Carrasco, Ka Wing Chan, Laura Völker, Pierrick Berruyer, Zhuoran Wang, Cory M. Widdifield, Moreno Lelli, David Gajan, Christophe Copéret, Chloé Thieuleux, Anne Lesage
Publikováno v:
Journal of the American Chemical Society
Journal of the American Chemical Society, 2022, 144 (23), pp.10270-10281. ⟨10.1021/jacs.2c01013⟩
Journal of the American Chemical Society, 2022, 144 (23), pp.10270-10281. ⟨10.1021/jacs.2c01013⟩
International audience; The structural characterization of supported molecular catalysts is challenging due to the low concentration of surface sites and the presence of several organic/organometallic surface groups resulting from the often complex s
Publikováno v:
Chemical Communications. 58:8214-8217
The grafting of an iridium-aluminium precursor onto silica followed by thermal treatment under H2 yields small (
Autor:
Clément Demarcy, Laurent Veyre, Marc Renom Carrasco, Clément Camp, Chloé Thieuleux, Walid Khodja
Publikováno v:
European Journal of Inorganic Chemistry
European Journal of Inorganic Chemistry, Wiley-VCH Verlag, 2021, 2021 (9), pp.814-820. ⟨10.1002/ejic.202001086⟩
European Journal of Inorganic Chemistry, Wiley-VCH Verlag, 2021, 2021 (9), pp.814-820. ⟨10.1002/ejic.202001086⟩
International audience; Supporting information for this article is given via a link at the end of the document.
Autor:
Thomas Galeandro‐Diamant, Vincent Dardun, Moulay Tahar Sougrati, Lorenzo Stievano, Kirill A. Lomachenko, Laurent Veyre, Valérie Meille, Chloé Thieuleux
Publikováno v:
European Journal of Inorganic Chemistry. 2022
Publikováno v:
Chemical communications (Cambridge, England). 58(25)
The low temperature regioselective hydrosilylation of various alkenes with (1,1,1,3,5,5,5-heptamethyltrisiloxane) MD
Autor:
Léon Escomel, Naïme Soulé, Emmanuel Robin, Iker Del Rosal, Laurent Maron, Erwann Jeanneau, Chloé Thieuleux, Clément Camp
Publikováno v:
Inorganic Chemistry
Inorganic Chemistry, 2022, 61 (15), pp.5715-5730. ⟨10.1021/acs.inorgchem.1c03120⟩
Inorganic Chemistry, 2022, 61 (15), pp.5715-5730. ⟨10.1021/acs.inorgchem.1c03120⟩
International audience; We report an original alkane elimination approach, entailing the protonolysis of triisobutylaluminum by the acidic hydrides from Cp*IrH4. This strategy allows access to a series of well-defined tri- and tetranuclear iridium al
Autor:
Jeremy Salaam, Isis N'Dala‐Louika, Cristina Balogh, Iurii Suleimanov, Guillaume Pilet, Laurent Veyre, Clément Camp, Chloé Thieuleux, François Riobé, Olivier Maury
Publikováno v:
European Journal of Inorganic Chemistry
European Journal of Inorganic Chemistry, In press, ⟨10.1002/ejic.202200412⟩
European Journal of Inorganic Chemistry, In press, ⟨10.1002/ejic.202200412⟩
International audience; A series of tris-dipicolinate europium complexes featuring different complexes has been prepared, and their photophysical study has been performed in the solid state highlighting the crucial role of second sphere water molecul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::198a76adf6625b272b14aeed76f46d13
https://hal.science/hal-03805366
https://hal.science/hal-03805366
Autor:
Sabria Benrabah, Maxime Legallais, Pascal Besson, Simon Ruel, Laura Vauche, Bernard Pelissier, Chloé Thieuleux, Bassem Salem, Matthew Charles
Publikováno v:
Applied Surface Science
Applied Surface Science, 2021, 582, pp.152309. ⟨10.1016/j.apsusc.2021.152309⟩
Applied Surface Science, 2021, 582, pp.152309. ⟨10.1016/j.apsusc.2021.152309⟩
International audience; The impact of several wet etchants commonly encountered in the microelectronic industry on the surface chemistry of GaN on silicon was explored. In order to get closer to fully recessed gate HEMT fabrication processes, we inve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b8b8383caa9cac518672fb28659c7fad
https://hal.science/hal-03805061/document
https://hal.science/hal-03805061/document