Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Chiranjeevi Vamala"'
Publikováno v:
Surface Science. 603:33-39
XPS and LEED have been used to characterize the interaction of sputter-deposited Pt (maximum coverage
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59caaac56626dc8cf4d64c310d3c3ded
https://doi.org/10.1016/j.susc.2008.10.025
https://doi.org/10.1016/j.susc.2008.10.025
Autor:
Jeffry A. Kelber, N.P. Magtoto, M. Jain, Chiranjeevi Vamala, D. R. Jennison, Peter A. Schultz
Publikováno v:
Surface Science. 601:3464-3471
The response of ordered ultrathin Al2O3 films on NiAl(1 1 0) and Ni3Al(1 1 0) substrates to sequential exposures at varying pressures of H2O between 10−7 Torr and 10−3 Torr, ambient temperature, was characterized by LEED, AES and density function
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e02862936b5f892befc189b18aad768b
https://doi.org/10.1016/j.susc.2007.06.036
https://doi.org/10.1016/j.susc.2007.06.036
Publikováno v:
MRS Proceedings. 1074
X-ray photoelectron spectroscopy (XPS) has been used to characterize the reactivities of clean, stoichiometric NiSi and Ni(Pt)Si films on n-doped Si(100) substrates in O2, and in O+O2 environments. In the presence of O+O2, NiSi and Ni(Pt)Si form Ni s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5dcc95b8b616d1dd8a08c4d0ec335efc
https://doi.org/10.1557/proc-1074-i03-04
https://doi.org/10.1557/proc-1074-i03-04