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pro vyhledávání: '"Chintana Athukorala"'
Autor:
Evan Franklin, Andrew Blakers, Wendy Jellett, Klaus Weber, Vernie Everett, Prakash Deenapanray, Daniel Macdonald, Chintana Athukorala
Publikováno v:
Progress in Photovoltaics: Research and Applications. 14:603-614
This paper investigates the reactive ion etching of SiO2 ,S i3N4, and Si using CHF3/O2 plasma. In particular, we have characterized the time and rf power dependence of the carrier lifetimes in n- and p-type FZ Si. The time dependence of reactive ion