Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Chinh Duc Prof. Tran"'
Autor:
Masaki Yoshioka, Max C. Schürmann, Guido Hergenhan, Christian Ziener, Guido Schriever, Denis Bolshukhin, Jürgen Dr. Kleinschmidt, Vladimir Dr. Korobochko, Chinh Duc Prof. Tran
Publikováno v:
SPIE Proceedings.
EUVL source development at XTREME technologies benefits from the learning gained in previous developments for EUV Micro Exposure and Alpha Tools. Field data available from operation of these tools represent the basis for continuous improvement in cor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d11791f016e6149bd9adfefa9c2773ff
https://doi.org/10.1117/12.772830
https://doi.org/10.1117/12.772830
Autor:
R. de Bruijn, Jürgen Dr. Kleinschmidt, Uwe Stamm, K. Gabel, D. Bolshukhin, Jens Ringling, Guido Schriever, Chinh Duc Prof. Tran, Björn Mader, S. Gotze, A. Keller, Guido Hergenhan, Jesko Dr. Brudermann, V. Korobotchko, A. Geier, C. Ziener, I. Ahmad
Publikováno v:
SPIE Proceedings.
In the paper we report about the progress made at XTREME technologies in the development of EUV sources based on gas discharge produced plasma (GDPP) technologies as well as the integration of collector optics. Optics from different suppliers were in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7662785b065c89b0f7d50f384bf4e6ee
https://doi.org/10.1117/12.599560
https://doi.org/10.1117/12.599560
Autor:
Christian H. Ziener, Jesko Dr. Brudermann, Vladimir Korobotchko, Frank Flohrer, Jürgen Dr. Kleinschmidt, Sven Götze, Kai Dr. Gäbel, Uwe Stamm, Guido Hergenhan, Guido Schriever, D. Bolshukhin, Imtiaz Ahmad, Diethard Klöpfel, Istvan Balogh, Henry Birner, S. Enke, Chinh Duc Prof. Tran, Jens Ringling
Publikováno v:
SPIE Proceedings.
Semiconductor chip manufacturers are expecting to use extreme UV lithography for production in 2009. EUV tools require high power, brilliant light sources at 13.5 nm with collector optics producing 120 W average power at entrance of the illuminator s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::506a64b648929274da7b635b33902a79
https://doi.org/10.1117/12.482676
https://doi.org/10.1117/12.482676