Zobrazeno 1 - 10
of 119
pro vyhledávání: '"Ching-Fa Yeh"'
Publikováno v:
Journal of Applied Physics; 5/15/2004, Vol. 95 Issue 10, p5788-5794, 7p, 1 Black and White Photograph, 1 Diagram, 10 Graphs
Autor:
Yu-Wu Wang, Horng Long Cheng, Ching Fa Yeh, Tang Hsiang Hu, Jia Chong Ho, Cheng-Chung Lee, Yi Kai Wang, Tan Fu Lei
Publikováno v:
Thin Solid Films. 491:305-310
The study addresses the factors of influence on the active matrix display that is driven by pentacene-based organic thin-film transistors (TFTs). The atmosphere and humidity conditions were found to seriously affect the performance of organic TFTs. A
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::080d8ccf0204f89df2fe5576af7e6faf
https://doi.org/10.1016/j.tsf.2005.06.012
https://doi.org/10.1016/j.tsf.2005.06.012
Autor:
Ching-Fa Yeh, Horng Long Cheng, Tang-Hsiang Hu, Jia-Chong Ho, Yu-Wu Wang, Tan Fu Lei, Cheng-Chung Lee, Yi-Kai Wang
Publikováno v:
Thin Solid Films. 467:215-219
This work concerns the electrical properties and carrier transport behavior of polycrystalline pentacene-based thin film transistors (TFTs) in air and high-vacuum environments. The transistor in a high vacuum outperforms that in air. The dependence o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b678ac34655466308b31c9034d0821c6
https://doi.org/10.1016/j.tsf.2004.04.001
https://doi.org/10.1016/j.tsf.2004.04.001
Publikováno v:
Microelectronic Engineering. 75:352-360
In this study, an efficient approach for the removal of colloidal silica abrasives from the polished copper surface was proposed and demonstrated. This post-chemical mechanical polishing (CMP) cleaning process combines a buffing process with dilute H
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::60fc1e92fd78d392d055794049974bec
https://doi.org/10.1016/j.mee.2004.06.006
https://doi.org/10.1016/j.mee.2004.06.006
Publikováno v:
Journal of Applied Physics. 95:5788-5794
This work examines the effects of grain boundaries on the performance and hot-carrier reliability of excimer-laser-annealed polycrystalline silicon thin film transistors (poly-Si TFTs) before and after NH3 plasma treatment. Self-aligned poly-Si TFTs,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c71d727429f8402905caf0d4eeed382
https://doi.org/10.1063/1.1699504
https://doi.org/10.1063/1.1699504
Autor:
Chih-Min Hsieh, Chih-Wen Hsiao, H. Kaneko, H. Aomi, Shiuan-Jeng Lin, Ching-Fa Yeh, Toshio Kusumi, Bau-Tong Dai, Ming-Shih Tsai
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 17:214-220
Cleanroom contamination and its impact on the performance of devices are beginning to be investigated due to the increasing sensitivity of the semiconductor manufacturing process to airborne molecular contamination (AMC). A clean bench was equipped w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::06b611350aac9d5506286b62bd80d63f
https://doi.org/10.1109/tsm.2004.826957
https://doi.org/10.1109/tsm.2004.826957
Publikováno v:
Applied Surface Science. 216:46-53
Post chemical mechanical polishing (CMP) cleaning is a key process for copper (Cu) CMP in dual damascene interconnection technology. During the post CMP cleaning, it is an important issue to minimize organic and Cu contamination residues on the diele
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e472aa204853b046d6a0d78d9db8dc5
https://doi.org/10.1016/s0169-4332(03)00496-3
https://doi.org/10.1016/s0169-4332(03)00496-3
Autor:
Darren Chi-Hsiang Chen, Cheng-Hong Liu, Chung Liu, Tai-Ju Chen, Cheng-Yu Lu, Ching-Fa Yeh, Su-Tseng Lee
Publikováno v:
Japanese Journal of Applied Physics. 41:6119-6126
Low-temperature (~300°C) N2O-plasma post-treatment for liquid-phase-deposited (LPD) gate oxide has been proposed for the first time. This treatment successfully takes the place of conventional furnace annealing in O2 ambient. Results of physicochemi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::167ee2fd7b47f4fe4c80e53bded8db6e
https://doi.org/10.1143/jjap.41.6119
https://doi.org/10.1143/jjap.41.6119
Publikováno v:
Microelectronic Engineering. 48:235-238
For nonvolatile memory applications, a novel oxide grown on polysilicon by anodic oxidation (anodic polyoxide) is first investigated. In this work, the electrical characteristics of anodic polyoxide is discussed and compared with the conventional the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::946d3f29a6f5045182c0ced1ff6ca945
https://doi.org/10.1016/s0167-9317(99)00378-0
https://doi.org/10.1016/s0167-9317(99)00378-0
Publikováno v:
Journal of The Electrochemical Society. 146:2294-2299
This work develops an alternative method, selective liquid-phase deposition (S-LPD), to fabricate contact holes instead of reactive ion etching. In preliminary experiments, deep n + /p junction diodes with contact holes prepared by S-LPD exhibit much
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ce2a1c1ceb9c9dd0175940b2b59c7655
https://doi.org/10.1149/1.1391930
https://doi.org/10.1149/1.1391930