Zobrazeno 1 - 10
of 30
pro vyhledávání: '"Chin Tien Yang"'
Publikováno v:
International Journal of Automation and Smart Technology, Vol 4, Iss 4, Pp 208-215 (2014)
In this study, we set-up an optically induced dielectrophoresis platform, which can be used to manipulate micro- and nanoscale particles. A commercially available liquid-crystal-display–based projector was used as a light source to produce a variet
Externí odkaz:
https://doaj.org/article/0c705d56b2c448c584d9b2aee7fce43a
Publikováno v:
International Journal of Materials Research. 107:703-712
Using a low temperature hydrothermal method, zinc oxide (ZnO) nanorod arrays were grown from seed layers coated on silicon substrates. The grown morphologies of the nanorod arrays heavily depend on the seed layer preparation methods. The grown nanoro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a0ddf7c9d5c442d3402b573093b5117b
https://doi.org/10.3139/146.111399
https://doi.org/10.3139/146.111399
Publikováno v:
International Journal of Automation and Smart Technology, Vol 4, Iss 4, Pp 208-215 (2014)
In this study, we set-up an optically induced dielectrophoresis platform, which can be used to manipulate micro- and nanoscale particles. A commercially available liquid-crystal-display–based projector was used as a light source to produce a variet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2106ef640a057f20de1289d1f241ce1a
https://doi.org/10.5875/ausmt.v4i4.797
https://doi.org/10.5875/ausmt.v4i4.797
Publikováno v:
Applied Mechanics and Materials. 419:756-760
The active stokehold protective garments (ASPG) can remove body heat of ship stokehold operators working in confined and extremely hot environment via conductive heat exchange from circulating water-cooled fluid next to the skin through the body-temp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::62a9d70bd79f553225d234e04ddc4992
https://doi.org/10.4028/www.scientific.net/amm.419.756
https://doi.org/10.4028/www.scientific.net/amm.419.756
Publikováno v:
Thin Solid Films. 542:409-414
The minimum etched pits of 300 nm diameter and the trenches of 300 nm width with a 50 nm depth for both geometries are prepared in the GeSbSn oxide photoresist on the silicon substrates. The lithographic patterns are recorded by direct laser writing,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1816886984d655b251276910b82a0c44
Autor:
Chung-Ta Cheng, Chun-Ming Chang, Wen-Jeng Hsueh, Mao-Jung Huang, Ming-Hua Shiao, Chin-Tien Yang, Donyau Chiang
Publikováno v:
Microsystem Technologies. 19:1745-1751
In this study, the combined technologies of dual-layer photoresist complimentary lithography (DPCL), inductively coupled plasma-reactive ion etching and laser direct-write lithography are applied to produce the submicron patterns on sapphire substrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::664c24f5ef33bd0d0de539b07f0599f2
https://doi.org/10.1007/s00542-013-1881-1
https://doi.org/10.1007/s00542-013-1881-1
Autor:
Chin-Tien Yang, Ming-Hua Shiao, Wen-Jeng Hsueh, Mao-Jung Huang, Chun-Ming Chang, Donyau Chiang
Publikováno v:
Metals and Materials International. 19:869-874
In this paper, we demonstrate and compare the formation of ordered etching masks for submicron-size patterned sapphire substrates through use of the nanosphere lithography and nanoimprint lithography methods. The metal honeycomb network structure and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::36355d98228e5d1e9353fbb7e3182a3f
https://doi.org/10.1007/s12540-013-4031-5
https://doi.org/10.1007/s12540-013-4031-5
Autor:
Shih-Wei Chen, Chin-Tien Yang, Rung-Ywan Tsai, Chung-Ta Cheng, Shuen-Chen Chen, Wen-Haw Lu, Chun-Chieh Huang
Publikováno v:
Optical Review. 20:185-188
The application of blue laser lithography for creating antireflective submicron structures on a crystalline silicon substrate was evaluated. The assembled blue laser lithography system was obtained by modifying a commercial blue laser optical pickup
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a11907610fa5892be1c720224873a4d5
https://doi.org/10.1007/s10043-013-0031-4
https://doi.org/10.1007/s10043-013-0031-4
Autor:
Chin Tien Yang, Wen-Jeng Hsueh, Chung Ta Cheng, Don Yau Chiang, Chun-Ming Chang, Ming Hua Shiao, Mao Jung Huang
Publikováno v:
Applied Mechanics and Materials. :334-341
In this study, the combined technologies of dual-layer photoresist complimentary lithography (DPCL), inductively coupled plasma-reactive ion etching (ICP-RIE) and laser direct-write lithography (LDL) are applied to produce the submicron patterns on s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::62ca26dd777dc9398e56d09b0c5eb910
https://doi.org/10.4028/www.scientific.net/amm.284-287.334
https://doi.org/10.4028/www.scientific.net/amm.284-287.334
Publikováno v:
IEEE Nanotechnology Magazine. 5:25-28
"We need to develop a nanolithography-based mastering process that can be transferred to commercial mass production. By the way, it must be low cost so we shall use a visible light instead of an electron beam (e-beam) or extreme ultraviolet (EUV) as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb26b6fc38be72ec7d12cf6e3ffd227b
https://doi.org/10.1109/mnano.2011.941953
https://doi.org/10.1109/mnano.2011.941953