Výsledky vyhledávání - "Chil Chieh Huang"

Effects of annealing conditions and thickness ratio of Si/Al films on the Hall carrier mobility, Al carrier concentration, and nanovoids formed in the metal-induced Si crystallization of Si/Al/Si/SiO2/glass specimens

Autor: Cheng Chang Peng, Min Hang Weng, B.H. Wu, Chil Chieh Huang, Chen-Kuei Chung, Jeri Fin Lin

Publikováno v: Surface and Coatings Technology. 205:4672-4682

In the present study, a-Si/μc-Al/a-Si/SiO 2 /glass specimens were prepared with various combinations of thicknesses of the μc-Al layer and the two a-Si layers. The effects of μc-Al film thickness, a-Si film thickness, the thickness ratio of Al fil

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::fe3c2cca76accfd447d7f98ebb9fb6f2
https://doi.org/10.1016/j.surfcoat.2011.04.032

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