Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Chihiro Ida"'
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
To fix the root cause of electrical failure chips, we do failure analysis by an electrical test. However, this analysis takes much long time because an electrical test is done after a few months since the defect occurred in in-line processes. To redu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d74a069d96720016521767b1197eff5
https://doi.org/10.1117/12.2583469
https://doi.org/10.1117/12.2583469
Autor:
Yusaku Suzuki, Chihiro Ida, Nishihata Takahiro, Yamamoto Takuma, Akira Hamaguchi, Maki Tanaka, Mayuka Osaki
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
A depth measurement technique for extremely deep holes (such as channel holes in 3D flash memory devices)—by using back-scattered-electron (BSE) images obtained by a high voltage critical dimension scanning electron microscope (CDSEM)— was develo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8a08dfd5615d49dea30c3b3290c75e7
https://doi.org/10.1117/12.2514799
https://doi.org/10.1117/12.2514799
Publikováno v:
Journal of applied mechanics. 10:675-682
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0d378a4701fb092dd226ab0071b54461
https://doi.org/10.2208/journalam.10.675
https://doi.org/10.2208/journalam.10.675
Publikováno v:
Doboku Gakkai Ronbunshuu B. 63:134-143
横越流堰の越流量を予測するには，流量式における流量係数を定量的に解明する必要がある．流量係数のパラメータは，フルード数，相対堰高，相対堰長および相対水深の４つであるが
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2fccd1d21f73e1157673b92cdea9f486
https://doi.org/10.2208/jscejb.63.134
https://doi.org/10.2208/jscejb.63.134
Autor:
Takahiro Nishihata, Mayuka Osaki, Maki Tanaka, Takuma Yamamoto, Akira Hamaguchi, Chihiro Ida, Yusaku Suzuki
Publikováno v:
Proceedings of SPIE; 1/22/2019, Vol. 10959, p1-9, 9p
Publikováno v:
PROCEEDINGS OF HYDRAULIC ENGINEERING. 50:835-840
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90e8f4b3b82486f06ca32218401cfd1f
https://doi.org/10.2208/prohe.50.835
https://doi.org/10.2208/prohe.50.835
Autor:
Takahiro Ikeda, Yuichiro Yamazaki, Akira Hamaguchi, Yasuhiko Ishibashi, Hideaki Abe, Chihiro Ida
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 13:041405
For robustness improvement of inline metrology tools, we propose an inline reference metrology system, named verification metrology system (VMS). This system combines inline metrology and nondestructive reference metrology tools. VMS can detect the f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2efc489c2f1947feb6ea73f64fdf429a
https://doi.org/10.1117/1.jmm.13.4.041405
https://doi.org/10.1117/1.jmm.13.4.041405
Autor:
Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Akira Hamaguchi, Takahiro lkeda, Yuichiro Yamazaki
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Oct-Dec2014, Vol. 13 Issue 4, p041405-1-041405-5, 5p