Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Chih-peng Lu"'
Autor:
Chih-Peng Lu, 盧志朋
105
The purpose of this study is to evaluate the performance of an overtopping wave energy converter by model test. A 1/25 overtopping wave energy model, which was designed by the National Chung-Shan Institute of Science & Technology, was made t
The purpose of this study is to evaluate the performance of an overtopping wave energy converter by model test. A 1/25 overtopping wave energy model, which was designed by the National Chung-Shan Institute of Science & Technology, was made t
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/cbuaz9
Autor:
Chih-Peng Lu, 呂志鵬
104
Graduate School of Business and Administration Shu-Te University A Study on the Participation-Motivation and well-being in Sport Clubs of Students from third grade to sixth grade in Elementary Schools in Kaohsiung City as Example Student：L
Graduate School of Business and Administration Shu-Te University A Study on the Participation-Motivation and well-being in Sport Clubs of Students from third grade to sixth grade in Elementary Schools in Kaohsiung City as Example Student：L
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/p2nsba
Autor:
Chih-peng Lu, 盧志朋
95
ESCO, the Energy Service Company, is still a brand new industry in Taiwan. For retrofitting the efficiency of domestic energy conservation and the environment it services for, by promoting private enterprises, developing ESCO industry is the
ESCO, the Energy Service Company, is still a brand new industry in Taiwan. For retrofitting the efficiency of domestic energy conservation and the environment it services for, by promoting private enterprises, developing ESCO industry is the
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/79419222224219397705
Autor:
Chih-Peng Lu, 盧志朋
88
Formaldehyde is being used widely in industry and medicine. There are many people who are exposed to formaldehyde occupationally. Low level of formaldehyde could cause eye, nose, and upper respiratory irritation. If exposed for a long time, i
Formaldehyde is being used widely in industry and medicine. There are many people who are exposed to formaldehyde occupationally. Low level of formaldehyde could cause eye, nose, and upper respiratory irritation. If exposed for a long time, i
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/40086075546569580485
Publikováno v:
Mathematical Problems in Engineering. 2015:1-8
TheH2control scheme and passivity theory are applied to investigate the stability criterion of continuous-time linear stochastic system subject to mixed performance. Based on the stochastic differential equation, the stochastic behaviors can be descr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81c16f31f4c11e38afabf015e94ddede
https://doi.org/10.1155/2015/831576
https://doi.org/10.1155/2015/831576
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 17:470-476
We have developed a number of novel solutions to use for one-step pregate oxide cleaning; they are based on tetraalkylammonium hydroxides of varying alkyl chain lengths, namely tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropyla
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::206461a8b47c65ce2fcea1f571cefc87
https://doi.org/10.1109/tsm.2004.831944
https://doi.org/10.1109/tsm.2004.831944
Autor:
Chih Peng Lu, Tien-Sheng Chao, Tung-Ming Pan, Ying Hao Lee, Tan Fu Lei, Fu-Hsiang Ko, Tzu Huan Chiu
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 14:365-371
In this study, various cleaning solutions containing chelating agents with carboxyl acid group (-COOH), such as ethylenediaminetetraacetic acid, citric acid and oxalic acid, were developed for post-poly-Si CMP cleaning. The chelating agent and tetram
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f7e27f56d22d792a9ee227299e2f1c5
https://doi.org/10.1109/66.964323
https://doi.org/10.1109/66.964323
Autor:
Tan Fu Lei, W.H. Chang, Chih Peng Lu, Tien-Sheng Chao, Wen Lu Yang, Ming Chi Liaw, Ming Shih Tsai, Chao Chyi Chen, Tung-Ming Pan
Publikováno v:
IEEE Electron Device Letters. 21:338-340
Novel cleaning solutions were developed for post-CMP process, surfactant tetra methyl ammonium hydroxide (TMAH) and/or chelating agent ethylene diamine tetra acetic acid (EDTA) were added into the diluted ammonium hydroxide (NH/sub 4/OH+H/sub 2/O) al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aaf1f8a1779907ec4d65777ea956b4fd
https://doi.org/10.1109/55.847373
https://doi.org/10.1109/55.847373
Autor:
Ming Chi Liaw, Tan Fu Lei, Fu-Hsiang Ko, Ying Hao Lee, Chih Peng Lu, Tien-Sheng Chao, Tung-Ming Pan
Publikováno v:
Journal of The Electrochemical Society. 149:G336
dMerck-Kanto, Advanced Chemicals Limited, Taoyuan, Taiwan The cleaning solutions augmented with tetraalkylammonium hydroxides ~TAAHs! with various chain-lengths of hydrocarbon substituents were developed for post-poly-Si chemical mechanical polishing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2399130deb09be49ecbc8e349d4715a
https://doi.org/10.1149/1.1474435
https://doi.org/10.1149/1.1474435
Autor:
Ying-Hao Li, Bau-Tong Dai, Chia-Fu Chen, Ting-Chun Wang, Ming-Shiann Feng, Jia-Min Shieh, Chih-Peng Lu, Kun-Cheng Lin, Shih-Chieh Chang
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:1311
By using an acid–copper electrolyte without levelers and brighteners, we achieved defect-free filling of 0.13 μm vias with aspect ratio 8:1. This novel electrolyte consisted of copper sulfate (CuSO4⋅5H2O), sulfuric acid (H2SO4), chloride ions (C
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::052622c6561758556a42e480f1cacd94
https://doi.org/10.1116/1.1486231
https://doi.org/10.1116/1.1486231