Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Chih Hsuan Chao"'
Publikováno v:
Educational Psychology. 39:1293-1310
The current study developed an intelligent learning environment for online education of research ethics and investigated how encouragement and warning intelligent feedback influenced learne...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f15c7b7c97e17fdcfca75509b89ad03
https://doi.org/10.1080/01443410.2018.1527291
https://doi.org/10.1080/01443410.2018.1527291
Publikováno v:
Applied Surface Science. 416:365-370
We sputter-deposited Pt nanoparticles with an average size ranging from 2.0 nm to 8.5 nm on the indium-tin oxide (ITO) glass substrate, and studied the effect of the size of Pt nanoparticles on electrocatalytic activity of the Pt/ITO electrode toward
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b24005bcec00d133ba3869dd57bd0a4f
https://doi.org/10.1016/j.apsusc.2017.04.156
https://doi.org/10.1016/j.apsusc.2017.04.156
Autor:
James Cheng, C. H. Twu, Jackie Cheng, Chih Hsuan Chao, Xin Ren Yu, Junjin Lin, Sweet Chen, Adder Lee, William Chou, Jeffrey Cheng, Heng Jen Lee, Edgar Huang, Young Ham, Po Tsang Chen, Colbert Lu, Josh Tzeng
Publikováno v:
Photomask Technology 2019.
In this paper we perform a foundational study on the impact of quartz etched depth, and optical density (OD) of mask opaque area, the 3D effect in ArF immersion lithography at advanced process node. The after development inspection (ADI) critical dim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1f2af7b79f6e41c38ad9888d9c2d2014
https://doi.org/10.1117/12.2537938
https://doi.org/10.1117/12.2537938
Autor:
William Chou, Mohamed Ramadan, James Cheng, Jeffrey Cheng, Sweet Chen, C. H. Twu, Michael Green, Colbert Lu, Hsin Fu Chou, Hong Jen Lee, Young Ham, Yohan Choi, Jackie Cheng, Chris Progler, Chih Hsuan Chao, Josh Tzeng, Adder Lee
Publikováno v:
Photomask Technology 2018.
Design weak points that have narrow process window and limits wafer yield, or hotspots, continue to be a major issue in semiconductor photolithography. Resolution enhancement techniques (RET) such as advanced optical proximity correction (OPC) techni
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::70ef41e9ab23d41ae729bb7cfebc5ae7
https://doi.org/10.1117/12.2501427
https://doi.org/10.1117/12.2501427
Autor:
Chou, William, Cheng, Jeffrey, Twu, C. H., Lee, Adder, Chih Hsuan Chao, Xin Ren Yu, Po Tsang Chen, Huang, Edgar, Junjin Lin, Sweet Chen, Cheng, James, Lu, Colbert, Tzeng Josh, Cheng, Jackie, Hong Jen Lee, Ham, Young
Publikováno v:
Proceedings of SPIE; 7/30/2019, Vol. 11148, p111481I-1-111481I-9, 9p
Autor:
Yohan Choi, Chou, William, Cheng, Jeffrey, Twu, C. H., Lee, Adder, Chih Hsuan Chao, Hsin Fu Chou, Sweet Chen, Cheng, James, Lu, Colbert, Tzeng Josh, Jackie Cheng, Hong Jen Lee, Green, Michael, Ramadan, Mohamed, Young Ham, Progler, Chris
Publikováno v:
Proceedings of SPIE; 8/26/2018, Vol. 10810, p108101K-1-108101K-11, 11p