Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Chien-Kui Hsu"'
Autor:
CHIEN-KUI HSU, 許兼貴
89
There are two major parts in this thesis. One is establishing the anti-reflective coatings technique for using in deep ultraviolet photomask. The other is to investigate the behavior of DUV photoresists for applying in electron beam direct wr
There are two major parts in this thesis. One is establishing the anti-reflective coatings technique for using in deep ultraviolet photomask. The other is to investigate the behavior of DUV photoresists for applying in electron beam direct wr
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/01628748885775596799
Publikováno v:
Journal of Physics and Chemistry of Solids. 65:1333-1336
A series of nano CoO–AlO x granular films were prepared by Ar–O 2 reactive rf sputtering and their resistive and magnetoresistive properties were measured for studying the spin-dependent properties. Transmission electron microscopy and X-ray phot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8fb8ddc88bd4b7fe11c30b535fcb74dd
https://doi.org/10.1016/j.jpcs.2004.03.002
https://doi.org/10.1016/j.jpcs.2004.03.002
Autor:
Run-Sheng Zhai, Arindam Das, Chien-Kui Hsu, Chau-Chung Han, Taizoon Canteenwala, T.J. Chuang, Long Y. Chiang
Publikováno v:
Carbon. 42:395-403
A new poly(fullerene oxide) thin film material has been fabricated by thermal activation and electron bombardment on hexanitro[60]fullerene (HNF) film deposited on a Au substrate, all under vacuum conditions. The reaction products in the polymerizati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7fe8ec912a9217e4401e4ca30471400c
https://doi.org/10.1016/j.carbon.2003.11.014
https://doi.org/10.1016/j.carbon.2003.11.014
Autor:
Chien-Kui Hsu, Tiao-Yuan Huang, Fu-Hsiang Ko, T.C. Chu, Hsuen-Li Chen, Ben-Chang Chen, L.S. Li
Publikováno v:
Japanese Journal of Applied Physics. 41:4163-4166
In the recent ITRS roadmap, electron beam based lithography would provide an approach to leading IC technologies from the generation of 180 nm. to sub-100 nm. As a consequence, high resolution and sensitivity resists for electron beam lithography are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f1332cb4adab489c75e947543ae06201
https://doi.org/10.1143/jjap.41.4163
https://doi.org/10.1143/jjap.41.4163
Autor:
Manabendra Mukherjee, Tung J. Chuang, Ping Chuang, Yuet Loy Chan, Ruth Klauser, Chien-Kui Hsu, Run-Sheng Zhai
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 20(9)
Methyl radicals are generated by pyrolysis of azomethane, and the condition for achieving neat adsorption on Cu(110) is described for studying their chemisorption and reaction characteristics. The radical-surface system is examined by X-ray photoemis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1f8b427737811f21bb53e995b56883f4
https://pubmed.ncbi.nlm.nih.gov/15875392
https://pubmed.ncbi.nlm.nih.gov/15875392
Publikováno v:
SPIE Proceedings.
In this paper, we demonstrated a novel anti-reflective coating structure for deep ultraviolet binary mask, which is based on three-layer Fabry-Perot Structure. The anti- reflective coating structure is composed of the chrome/oxide/chrome stack. By ad
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::652cdbba3c0c5bc1f44e7ff275af512c
https://doi.org/10.1117/12.438347
https://doi.org/10.1117/12.438347
Autor:
Tiao-Yuan Huang, Chien-Kui Hsu, Ben-Chang Chen, Jung-Yen Yang, T.C. Chu, Fu-Hsiang Ko, Hsuen-Li Chen
Publikováno v:
SPIE Proceedings.
Chemically amplified resists have been widely used in deep UV optical lithography. In this paper, we characterized positive deep UV resists for high-resolution electron beam lithography applications. Results indicate this deep UV resist is very high
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e2062c7eebb46674ac1752acd96eec1
https://doi.org/10.1117/12.436705
https://doi.org/10.1117/12.436705
Autor:
Fu-Hsiang Ko, Hsuen-Li Chen, Wonder Fan, Tzyy Jyann Wang, Tung Jung Chuang, Run Sheng Zhai, Chien Kui Hsu
Publikováno v:
Applied Optics. 43:2141
We demonstrate an optical-gradient bottom antireflective coating (BARC) film, which can be easily prepared by treating a silicon nitride film with oxygen plasma. The oxygen composition is gradually decreased inside the silicon nitride film. The optic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f18e3fa291d5eb93da5a9639b00da163
https://doi.org/10.1364/ao.43.002141
https://doi.org/10.1364/ao.43.002141
Publikováno v:
Applied Optics. 41:3961
We demonstrate an antireflective coating structure, which is based on the three-layer metal interference called the Fabry-Perot structure, for a deep-ultraviolet binary mask. The antireflective coating structure is composed of a metal-oxide-metal sta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c603fa628aa7453d25989f271236bad2
https://doi.org/10.1364/ao.41.003961
https://doi.org/10.1364/ao.41.003961
Publikováno v:
ChemPhysChem; Jul2004, Vol. 5 Issue 7, p1038-1041, 4p