Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Chien-Hsuan Pan"'
Autor:
Chien-Hsuan Pan, 潘建瑄
98
In an attempt to perform hydrophobic nano-coating, low-pressure plasma chemical vapor deposition technique was employed to deposit fluorocarbon thin film on silicon wafer substrates in this study. We also deposited films on different substrat
In an attempt to perform hydrophobic nano-coating, low-pressure plasma chemical vapor deposition technique was employed to deposit fluorocarbon thin film on silicon wafer substrates in this study. We also deposited films on different substrat
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/33500497835207707537
Autor:
Chieh-An Wang, Chien-Hsuan Pan, Chien-Hsiuo Liu, Shih-Han Wang, Chia-Ting Su, Yi Chen, Fan-Ya Su, Wei-Shan Lin, Hsin-Yu (Ariel) Chiang
Publikováno v:
Hong Kong Journal of Occupational Therapy. 23(2):62-68
Objective/Background Although fieldwork experience plays an important role in an occupational therapy (OT) student's choice of future area of practice, studies on the influences of fieldwork on the preference of practice areas remain limited. The goa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6b9d1d2f2c8f08252fc1d03704113caf
Publikováno v:
Surface and Coatings Technology. 231:47-52
In order to control of the surface properties to create the oleophobic fluorocarbon film, this study reported the influence of low pressure CH 2 F 2 /Ar plasma processing on oil repellent thin film growth. Difluoromethane (CH 2 F 2 )/argon (Ar) gas m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b850874f5fa117d54a57fb03dfad166
https://doi.org/10.1016/j.surfcoat.2012.05.060
https://doi.org/10.1016/j.surfcoat.2012.05.060
Publikováno v:
Journal of the Chinese Chemical Society. 57:1208-1211
Protective SiOx coating on polymeric substrates were deposited at room temperature by atmospheric pressure plasma jet (APPJ), using HMDSO (Hexamethylsiloxane) as monomer and argon (Ar) as carrier gas, have been investigated for the surface properties
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2de7e251b665f04e5d0bee7316922c89
https://doi.org/10.1002/jccs.201000177
https://doi.org/10.1002/jccs.201000177
Deposition of hydrophobic nano-coatings with low-pressure radio frequency CH2F2/Ar plasma processing
Publikováno v:
Thin Solid Films. 518:3570-3574
In an attempt to perform hydrophobic nano-coating, this investigation examined various operational parameters including in RF plasma power, system gas pressure, and CH2F2:Ar ratio of low-pressure plasma processing. The low-pressure plasma, generated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbe48800f21a0d6345f6aab5523f837d
https://doi.org/10.1016/j.tsf.2009.12.013
https://doi.org/10.1016/j.tsf.2009.12.013
Publikováno v:
The 4th IEEE International NanoElectronics Conference.
The optical emission analysis to plasma polymerized nano-film growth was studied. The objective of this study was to examine the distinctive glow features of low-temperature RF difluoromethane (CH 2 F 2 ) plasma polymerization and its correlation wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e804454f61d1523f1dc8122ff12377a
https://doi.org/10.1109/inec.2011.5991652
https://doi.org/10.1109/inec.2011.5991652
Publikováno v:
IEEE Transactions on Plasma Science. 39:2506-2507
The glow characteristics and deposited film structures of fluorocarbon monomers in radio-frequency glow discharges are investigated using CH2F2 and C2H2F4, which were compared to hydrocarbon monomer such as CH4. The glow was characterized and investi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::937c9c10f5499aa7c6053cab3229028b
https://doi.org/10.1109/tps.2011.2157528
https://doi.org/10.1109/tps.2011.2157528