Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Chia-Ping Lo"'
Autor:
Chia-Ping Lo, 羅佳蘋
92
An enterprise has to continuously develop along with the ever-growing technology to keep up its competiveness on the market. The quality of its products and services plays a key role. Good quality environment lies on the people, business and
An enterprise has to continuously develop along with the ever-growing technology to keep up its competiveness on the market. The quality of its products and services plays a key role. Good quality environment lies on the people, business and
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/23455508370912767371
Autor:
Chun-Wen Nieh, Kuan-Lun Cheng, Ming-Ta Lei, Chung-Cheng Wu, Da-Wen Lin, R. Lin, B. Tarng, Carlos H. Diaz, Chii-Ming Wu, Che-Min Chu, Shyh-Wei Wang, M.Y. Wang, Ming-Lung Cheng, Chia-Ping Lo, Wen-Chi Tsai, Ming-Jer Chen, Yi-Ming Sheu
Publikováno v:
IEEE Electron Device Letters. 29:998-1000
We demonstrate, for the first time, an integration-friendly selective PMOSFET fully silicided (FUSI) gate process. In this process, a millisecond-anneal (MSA) technique is utilized for the nickel silicide phase transformation. A highly tensile FUSI g
Autor:
Chia-Ping, Lo
Thesis (M.A.)--Yuan Ze University Department of Industrial Engineering and Management
Non-Latin script record. Includes bibliographical references
Non-Latin script record. Includes bibliographical references
Autor:
Da-Wen Lin, Wang, Maureen, Ming-Lung Cheng, Yi-Ming Sheu, Tarng, Bennet, Che-Min Chu, Chun-Wen Nieh, Chia-Ping Lo, Wen-Chi Tsai, Lin, Rachel, Shyh-Wei Wang, Kuan-Lun Cheng, Chii-Ming Wu, Ming-Ta Lei, Chung-Cheng Wu, Diaz, Carlos H., Ming-Jer Chen
Publikováno v:
IEEE Electron Device Letters; Sep2008, Vol. 29 Issue 9, p998-1000, 3p, 3 Diagrams, 2 Graphs