Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Chi Fo Tsang"'
Publikováno v:
Microelectronic Engineering. 75:183-193
An understanding of adhesion strength at Cu/barrier interface and Cu layer properties at different metal level is necessary to develop a robust planarization (CMP) process without peeling and delamination. This paper quantitatively analyzes the relat
Autor:
Chi Fo Tsang, Hui Kim Hui
Publikováno v:
Thermochimica Acta. :93-99
Dynamic mechanical analysis (DMA) measures mechanical properties (modulus and damping) of viscoelastic materials over a spectrum of time (or frequency) and temperature. This paper reports its use to study four epoxy molding compounds (EMC1A, 1B, 2 an
Autor:
Hui Kim Hui, Chi Fo Tsang
Publikováno v:
Thermochimica Acta. :169-175
This paper introduces an alternative way to the curing investigations of polymeric die attach adhesives using dynamic mechanical analysis (DMA). Proper curing of die attach adhesives is essential to provide adhesive strength and reliability of adhesi
Autor:
Chi Fo Tsang
Publikováno v:
Microelectronics International. 17:27-41
UV curing processes of materials have to be specially designed accordingly in order to obtain the optimized property for different electronics applications. The purpose of this study is to characterize and study the curing and thermal behavior of a t
Effect of nitrogen and oxygen annealing on the morphology and hardness behavior of copper thin films
Autor:
Chi Fo Tsang, Jasmine Woo
Publikováno v:
Materials Characterization. 45:187-194
The morphology and hardness behavior of the 0.25-μm thick, chemical vapor-deposited (CVD) copper on SiO 2 on top of Si substrates annealed under oxygen and nitrogen atmosphere were evaluated by atomic force microscopy (AFM) and ultra micro-indentati
Autor:
Chi Fo Tsang, Hui Kim Hui
Publikováno v:
Surface and Interface Analysis. 29:735-742
Chemical-vapour-deposited copper film (250 nm) on 500 nm SiO2/Si substrates was evaluated by dynamic ultramicroindentation, scanning electron microscopy (SEM) and atomic force microscopy (AFM). Surface hardness and roughness measurements provide impo
Publikováno v:
Journal of Materials Chemistry. 8:425-428
Reduction of aqueous sodium and potassium vanadates with aqueous ABH4 (A=Na and K) at ambient temperatures has been investigated systematically to obtain reduced vanadium oxides. Although the as-prepared samples do not show any discernible diffractio
Autor:
Chi Fo Tsang, Arumugam Manthiram
Publikováno v:
Journal of The Electrochemical Society. 144:520-524
Nanocrystalline VO{sub 2} having a metastable shear structure, designated as VO{sub 2}(B), has been synthesized by a simple chemical method. The procedure involves a reduction of aqueous potassium vanadate solution with potassium borohydride around p
Autor:
Arumugam Manthiram, Chi Fo Tsang
Publikováno v:
Journal of Materials Chemistry. 7:1003-1006
Reduction of Na 2 MoO 4 with NaBH 4 in aqueous solutions at ambient temperatures has been investigated systematically by varying the concentration and volume of NaBH 4 as well as the reaction pH. The reduction products have been characterized by X-ra
Autor:
Chi Fo Tsang, Arumugam Manthiram
Publikováno v:
Solid State Ionics. 89:305-312
Li x Mn 3 − x O 4 ( x ~ 1.08) spinel oxides have been synthesized by a new procedure. The method involves an ambient temperature synthesis of MnO 2 by reducing aqueous KMnO 4 with KBH 4 followed by an ambient temperature insertion of Li into MnO 2