Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Cheong Yew Shun"'
Publikováno v:
2006 Thirty-First IEEE/CPMT International Electronics Manufacturing Technology Symposium.
This work discusses the extension of conventional method using binary masks in enhancing contact hole resolution. This can be achieved by selection of masks, mask design including choice of optical proximity correction (OPC), exposure tool, illuminat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0401b6ca82f0f7acef649b0b1b979b40
https://doi.org/10.1109/iemt.2006.4456490
https://doi.org/10.1109/iemt.2006.4456490
Publikováno v:
2006 IEEE International Conference on Semiconductor Electronics.
The shrinking of contact opening is inevitable, as the technology progresses. The most obvious shrink strategies, wavelength reduction and phase-shifting masks (PSM) offer the most significant improvements to meet these demands, but at a hefty price.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78ee082b99ec883951a460e2e08f4101
https://doi.org/10.1109/smelec.2006.381098
https://doi.org/10.1109/smelec.2006.381098
Publikováno v:
2006 IEEE International Conference on Semiconductor Electronics; 2006, p434-437, 4p
Publikováno v:
2006 Thirty-First IEEE/CPMT International Electronics Manufacturing Technology Symposium; 2006, p431-436, 6p