Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Cheon Heo"'
Autor:
Byeongchan So, Kyungbae Lee, Kyungjae Lee, Cheon Heo, Jaedo Pyeon, Kwangse Ko, Jongjin Jang, Okhyun Nam
Publikováno v:
Journal of Nanoscience and Nanotechnology. 16:4914-4918
This study investigated GaN epitaxial layer growth with a conductive Al(x)Ga(1-x)N buffer layer on n-type 4H-SiC by high-temperature metalorganic chemical vapor deposition (HT-MOCVD). The Al composition of the Al(x)Ga(1-x)N buffer was varied from 0%
Publikováno v:
Journal of nanoscience and nanotechnology. 17(1)
We investigated the correlation between the crystal quality and two-dimensional electron gas (2DEG) mobility of an AlGaN/GaN high-electron-mobility transistor (HEMT) structure grown by metal-organic chemical vapor deposition. For the structure with a
Publikováno v:
Displays. 40:9-16
An increasing number of studies on efficient implementation of vivid and realistic displays are being conducted as liquid crystal displays (LCDs) become widely used in TV applications. For vivid displays, the specifications such as wide color gamut (
Publikováno v:
Journal of Nanoscience and Nanotechnology. 15:8401-8406
In this study, we suggest a polarity-selective in-situ thermal etching and re-growth process for the fabrication of high quality Al terminated AIN epilayers by high temperature metalorganic chemical vapor deposition. Mixed-polar AIN layers grown on a
Publikováno v:
Journal of Nanoscience and Nanotechnology. 15:5144-5147
This study investigates the crystallographic polarity transition of AIN layers grown by high temperature metalorganic chemical vapor deposition (HT-MOCVD), with varying trimethylaluminum (TMAI) pre-flow rates. AIN layers grown without TMAI pre-flow h
Autor:
Byeongchan, So, Kyungbae, Lee, Kyungjae, Lee, Cheon, Heo, Jaedo, Pyeon, Kwangse, Ko, Jongjin, Jang, Okhyun, Nam
Publikováno v:
Journal of nanoscience and nanotechnology. 16(5)
This study investigated GaN epitaxial layer growth with a conductive Al(x)Ga(1-x)N buffer layer on n-type 4H-SiC by high-temperature metalorganic chemical vapor deposition (HT-MOCVD). The Al composition of the Al(x)Ga(1-x)N buffer was varied from 0%
Autor:
Kwangse Ko, Sang-Woo Han, Okhyun Nam, Byeongchan So, Cheon Heo, Kyeongjae Lee, Kyungbae Lee, Taemyung Kwak, Ho-Young Cha
Publikováno v:
Japanese Journal of Applied Physics. 56:015502
The present study investigated the Mg doping effect in the gallium nitride (GaN) buffer layers (BLs) of AlGaN/GaN high-electron-mobility transistor (HEMT) structures grown on semi-insulating 4H-SiC substrates by metal organic chemical vapor depositio
Autor:
Kwangse Ko, Kyeongjae Lee, Byeongchan So, Cheon Heo, Kyungbae Lee, Taemyung Kwak, Sang-Woo Han, Ho-Young Cha, Okhyun Nam
Publikováno v:
Japanese Journal of Applied Physics; Jan2017, Vol. 56 Issue 1, p1-1, 1p