The effect of O2 plasma post-treatment on atomic layer deposited TiO2 thin films

Autor: Kim, Byunguk, Kang, Taeseong, Song, Seokhwi, Jung, Chanwon, Lee, Jungho, Cheon, SeongHak, Jeon, Hyeongtag

Publikováno v: In Vacuum May 2022 199

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Atomic layer deposition for rutile structure TiO 2 thin films using a SnO 2 seed layer and low temperature heat treatment.

Autor: Kim B; Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Republic of Korea., Choi Y; Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Republic of Korea., Lee D; Mecaro Advanced Precursor System R&D Center, 261 Weonnamsandan-ro, Republic of Korea., Cheon S; Mecaro Advanced Precursor System R&D Center, 261 Weonnamsandan-ro, Republic of Korea., Byun Y; Mecaro Advanced Precursor System R&D Center, 261 Weonnamsandan-ro, Republic of Korea., Jeon H; Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Republic of Korea.; Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Republic of Korea.

Publikováno v: Nanotechnology [Nanotechnology] 2021 Dec 22; Vol. 33 (11). Date of Electronic Publication: 2021 Dec 22.