Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Cheng-Chin Liu"'
Autor:
Cheng-Chin Liu, Kathryn Hsu, Melinda S. Peng, Der-Song Chen, Pao-Liang Chang, Ling-Feng Hsiao, Chin-Tzu Fong, Jing-Shan Hong, Chia-Ping Cheng, Kuo-Chen Lu, Chia-Rong Chen, Hung-Chi Kuo
Publikováno v:
npj Climate and Atmospheric Science, Vol 7, Iss 1, Pp 1-12 (2024)
Abstract Recent development of artificial intelligence (AI) technology has resulted in the fruition of machine learning-based weather prediction (MLWP) systems. Five prominent global MLWP model, Pangu-Weather, FourCastNet v2 (FCN2), GraphCast, FuXi,
Externí odkaz:
https://doaj.org/article/d9679c76540347f6851eb45ec81c9459
Publikováno v:
Terrestrial, Atmospheric and Oceanic Sciences, Vol 27, Iss 6, p 991 (2016)
Typhoon Morakot hit southern Taiwan in 2009, bringing 48-hr of heavy rainfall [close to the Probable Maximum Precipitation (PMP)] to the Tsengwen Reservoir catchment. This extreme rainfall event resulted from the combined (co-movement) effect of two
Externí odkaz:
https://doaj.org/article/15b5f0c1015e4502a3285722a9413253
Publikováno v:
Terrestrial, Atmospheric and Oceanic Sciences, Vol 24, Iss 3, p 369 (2013)
A singular-value-decomposition (SVD) statistical downscaling technique was developed for monthly rainfall over southern Taiwan. The statistical model was applied to seven different general circulation models. Seven different geographical domains for
Externí odkaz:
https://doaj.org/article/5b70b5293c6a435d8c55aa9335c8d2dc
Autor:
Cheng-Chin Liu, 劉政欽
96
Recently, active matrix organic diode displays (AMOLEDs) become the most advanced technology in the market; organic light-emitting diodes (OLEDs) and organic thin film transistors (OTFTs) enable the fabrication of low-cost, flexible, full col
Recently, active matrix organic diode displays (AMOLEDs) become the most advanced technology in the market; organic light-emitting diodes (OLEDs) and organic thin film transistors (OTFTs) enable the fabrication of low-cost, flexible, full col
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/72340561191615025168
Publikováno v:
Terrestrial, Atmospheric and Oceanic Sciences, Vol 27, Iss 6, p 991 (2016)
Typhoon Morakot hit southern Taiwan in 2009, bringing 48-hr of heavy rainfall [close to the Probable Maximum Precipitation (PMP)] to the Tsengwen Reservoir catchment. This extreme rainfall event resulted from the combined (co-movement) effect of two
Publikováno v:
Organic Electronics. 10:815-821
We have developed a technique for the preparation of thin film transistors (TFTs) through the self-patterning of various organic and inorganic materials via solution processing using a wide range of solvents. To obtain selectively self-patterned laye
Autor:
Kuo-Jui Chang, Shih-Wei Tu, Wei-Kai Lin, Ta-Chuan Liao, Huang-Chung Cheng, Chii-Wen Chen, Cheng-Chin Liu, Feng-Tso Chien
Publikováno v:
ECS Transactions. 13:1-8
This work studies the NH3 plasma passivation on a novel gate-all-around poly-Si TFTs with multiple nanowire channels (GAA-MNC TFTs). The NH3 plasma passivation can effectively passivate the defects in poly-Si channel and improve the electrical perfor
Publikováno v:
Organic Electronics. 9:925-929
We have successfully demonstrated a polymeric semiconductor-based transistor with low-k polymer/high-k metal-oxide (TiO2) bilayer as gate dielectric. The TiO2 layers are readily processable from solution and cured at low temperature, instead of tradi
Autor:
Shih-Wei Tu, Ming-Jiue Yu, Ya-Hsiang Tai, Kuo-Jui Chang, Huang-Chung Cheng, Cheng-Chin Liu, Ta-Chuan Liao, Wei-Kai Lin
Publikováno v:
IEEE Electron Device Letters. 29:889-891
The novel gate-all-around (GAA) poly-Si thin-film transistors (TFTs) with multiple nanowire channels (MNCs) have been, for the first time, fabricated using a simple process to demonstrate high-performance electrical characteristics and high immunity
Publikováno v:
MRS Proceedings. 1091
We have successfully proposed a patterned P3HT thin-film transistor with cross-linked PVP as a passivation material which was cured at low temperature. The active P3HT layer was isolated via photolithographic technique and O2 plasma RIE etching proce