Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Chenevier, Bernard"'
Autor:
Kiwa, Toshihiko, Yokoya, Takayoshi, Chenevier, Bernard, Cosmo, Valeria Di, Truccato, Marco, Sacks, William, Sauerwein, Wolfgang
Publikováno v:
Bulletin of Institute for Education and Student Services, Okayama University. 6:148-165
Based on a statistical analysis of R&D activities in the field of superconductivity (SC) in a broad sense, the paper reports that Japan's leadership is strong over the past 20 years, in terms of researchers publications and patents. It also essential
A very promising piezoelectric property of Ta2O5 thin films. I: Monoclinic-trigonal phase transition
Autor:
Audier, Marc, Chenevier, Bernard, Roussel, Herve, Vincent, Loïc, Peña, Alexandra, Lintanf-Salaün, Amélie
Publikováno v:
Journal of Solid State Chemistry
Journal of Solid State Chemistry, Elsevier, 2011, 184 (8), pp.2023-2032. ⟨10.1016/j.jssc.2011.06.001⟩
Journal of Solid State Chemistry, Elsevier, 2011, 184 (8), pp.2023-2032. ⟨10.1016/j.jssc.2011.06.001⟩
International audience; Ceramic thin films of tantalum oxide of a new trigonal structure (a=12.713(7) angstrom, alpha = 28.201(0)degrees, space-group R3) were produced by thermal treatments of amorphous deposits on (001)Si wafers, either by electrost
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::ef0ac6c460e0fbbd255df41e2f59abbf
https://hal.archives-ouvertes.fr/hal-00942956
https://hal.archives-ouvertes.fr/hal-00942956
Publikováno v:
Electrochemical and Solid-State Letters
Electrochemical and Solid-State Letters, Electrochemical Society, 2009, 12 (7), pp.H272-H274. ⟨10.1149/1.3126495⟩
Electrochemical and Solid-State Letters, 2009, 12 (7), pp.H272-H274. ⟨10.1149/1.3126495⟩
Electrochemical and Solid-State Letters, Electrochemical Society, 2009, 12 (7), pp.H272-H274. ⟨10.1149/1.3126495⟩
Electrochemical and Solid-State Letters, 2009, 12 (7), pp.H272-H274. ⟨10.1149/1.3126495⟩
International audience; In this article, the achievement of TixSiyNz metal gates with tunable work function is demonstrated using partial saturation during pulsing chemical vapor deposition. Thin films were deposited on SiO2 using a pulse sequence wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::7974e3d0d74bb448c5c757318506304c
https://hal.archives-ouvertes.fr/hal-01067596
https://hal.archives-ouvertes.fr/hal-01067596
Publikováno v:
Journal of Physics and Chemistry of Solids
Journal of Physics and Chemistry of Solids, Elsevier, 2002, 63, pp.1889
Journal of Physics and Chemistry of Solids, Elsevier, 2002, 63, pp.1889
12 pages; International audience; X-ray diffraction experiments have been combined to Raman scattering and transmission electron microscopy data to analyze the result of rapid thermal annealing applied to Zr films, 16 or 80 nm thick, sputtered on Si1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::add03a7b91dc6c8d892f06167e6dac24
https://hal.archives-ouvertes.fr/hal-00207762/document
https://hal.archives-ouvertes.fr/hal-00207762/document
Autor:
Matko, Igor, Chenevier, Bernard, Bluet, Jean Marie, Madar, Roland, Letertre, Fabrice, Saikaly, Wahib
Publikováno v:
Materials Science Forum; September 2007, Vol. 556 Issue: 1 p255-258, 4p
Autor:
Matko, Igor, Chenevier, Bernard, Madar, Roland, Roussel, H., Coindeau, Stephane, Letertre, Fabrice, Richtarch, Claire, Di Cioccio, Lea
Publikováno v:
Materials Science Forum; May 2005, Vol. 483 Issue: 1 p781-784, 4p
Autor:
Matko, Igor, Chenevier, Bernard, Audier, M., Madar, Roland, Diani, M., Simon, L., Kubler, L., Aubel, D.
Publikováno v:
Materials Science Forum; April 2002, Vol. 389 Issue: 1 p315-318, 4p
Autor:
Safonova, Olga V., Neisius, Thomas, Ryzhikov, Andrey, Chenevier, Bernard, Gaskov, Aleksandre M., Labeau, Michel
Publikováno v:
Chemical Communications; 2005, Vol. 2005 Issue: 41 p5202-5204, 3p
Publikováno v:
In Microelectronic Engineering 2010 87(3):243-244
Autor:
Kitaguchi, Hitoshi a, *, Miao, Hanping a, Kumakura, Hiroaki a, Togano, Kazumasa a, Chenevier, Bernard b
Publikováno v:
In Physica C: Superconductivity and its applications 1998 301(1):111-115