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Autor:
Naigui Shang, Cheehow Lee, Zhangda Lin, Shuit-Tong Lee, I. Bello, Ning Wang, Liang-Sheng Liao
Publikováno v:
Physical Review B. 62:17134-17137
Surface passivation is introduced to suppress the deleterious effect of Si surface oxides and thus enhance diamond heteroepitaxial nucleation. Surface composition and diamond nucleation and growth on H-, Br-, and I-passivated Si surfaces were studied