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pro vyhledávání: '"Chau Chiung Wang"'
Autor:
Chau Chiung Wang, Mao-Chieh Chen, Chung I. Chang, Zhe Min Zhu, Yu Lin Liu, Peng Sen Chen, Zhen Cheng Wu, Ren Guay Wu, Jiann Fu Chen, L. J. Chen
Publikováno v:
Journal of The Electrochemical Society. 146:4290-4297
This work investigates the integration of very thin sputtered Ta and reactively sputtered TaN barriers with Cu and a low‐dielectricconstant (low‐K) layer of poly(arylene ether) (PAE‐2). It is found that Cu readily penetrates into PAE‐2 and de
Autor:
Chau-Chiung Wang, 王超群
87
This thesis investigates the thermal stability and electrical properties of the low-k dielectric material of PAE-2 film. The dielectric constant of the PAE-2 film was determined to be 2.9 and the PAE-2 film was thermally stable up to 450oC. T
This thesis investigates the thermal stability and electrical properties of the low-k dielectric material of PAE-2 film. The dielectric constant of the PAE-2 film was determined to be 2.9 and the PAE-2 film was thermally stable up to 450oC. T
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/51448599349551030494