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pro vyhledávání: '"Charu Tejwani"'
Autor:
Sumanth Kini, Andrew Stamper, Charu Tejwani, Sang Y. Chong, Carol Boye, Ralf Buengener, Roland Hahn, Bryan N. Rhoads, Sean D. Burns, Kourosh Nafisi, Colin J. Brodsky, S. Fan
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 24:165-172
PWC (Process Window Centering) is an efficient methodology to validate or adjust and center the overall process window for a particular lithography layer by detecting systematic and random defects. The PWC methodology incorporates a defect inspection
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::50cfd0b0aee5204dab868442dbd3ea7c
https://doi.org/10.1109/tsm.2011.2106807
https://doi.org/10.1109/tsm.2011.2106807
