Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Charles J. Neef"'
Autor:
Abdulrahman Alhathir, Eric Mullins, Charles Ault, Tyler Fleske, Tabytha C. Yeary, Benjamin O. Tayo, Charles J. Neef
Publikováno v:
Journal of Applied Polymer Science. 140
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9ad30cf92263876768adc14d182015a
https://doi.org/10.1002/app.53680
https://doi.org/10.1002/app.53680
Autor:
Charles Ault, Chris S. Hance, Charles J. Neef, Ahmed Alzharani, Esam Allehyani, Benjamin O. Tayo, Raymond B. Westby
Publikováno v:
Journal of Electroanalytical Chemistry. 786:129-134
Copolymers from vinylferrocene and 3-phenyl[5]ferrocenophane with N-ethyl and N-phenylmaleimide were electrochemically characterized. The deposition method of the polymer onto the electrode by oxidative deposition or cast film was studied and showed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::576942488982c352cc4488e6034eea8e
https://doi.org/10.1016/j.jelechem.2017.01.024
https://doi.org/10.1016/j.jelechem.2017.01.024
Autor:
Jake A. Stanley, Robert A. Rogers, Ben Martin, Todd W. Hudnall, Charles J. Neef, William J. Brittain, Nicholas Douglas, Jacob Armitage
Publikováno v:
Journal of Physical Organic Chemistry. 26:688-695
The synthesis and reactivity of a tetrahydrochromeno[2,3-b]indoles are reported. Evidence for reversible ring-opening is based on H/D exchange and trapping experiments. These compounds readily undergo reaction with tetra-n-butylammonium cyanide. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0739e05f0f6d0c41ae4178b25f35770a
https://doi.org/10.1002/poc.3158
https://doi.org/10.1002/poc.3158
Autor:
Jennifer A. Irvin, Jamie R. Carberry, Charles J. Neef, Kenneth M. Nicholas, Daniel T. Glatzhofer
Publikováno v:
Reactive and Functional Polymers. 73:730-736
Two series of ferrocene-containing polymers have been synthesized from various N-substituted maleimides with 3-phenyl[5]ferrocenophane-1,5-dimethylene (3A–C) or vinylferrocene (4A–C). These copolymers exhibit high molecular weights and 4A–C for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dc899ea2bf12b1d87c8995eac372697c
https://doi.org/10.1016/j.reactfunctpolym.2013.03.002
https://doi.org/10.1016/j.reactfunctpolym.2013.03.002
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 35:3365-3376
Radical cyclopolymerization of 3-phenyl[5]ferrocenophane-1,5-dimethylene (2) and copolymerization with styrene gave polymers (3 and 4) with [3]ferrocenophane moieties pendant to the backbone. Cyclic voltammetry (CV) on polymer 3 in CH2Cl2 showed two
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b82f85c93059eece4d0b3aeef9a1921
https://doi.org/10.1002/(sici)1099-0518(19971130)35:16<3365::aid-pola4>3.0.co
https://doi.org/10.1002/(sici)1099-0518(19971130)35:16<3365::aid-pola4>3.0.co
Autor:
Charles J. Neef, Anne K. St. Clair, Kevin M. Kane, Gordon L. Tullos, Jennifer A. Irvin, Patrick E. Cassidy
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 30:1675-1679
A series of fluorinated aromatic polyethers was synthesized via aromatic nucleophilic substitution of highly fluorinated aromatics (1,2,4,5-tetrafluorobenzene, hexafluorobenzene, and decafluorobiphenyl) with bisphenol AF or bisphenol A. Polymerizatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c26b7fccfe3e14554689629e60f1fd26
https://doi.org/10.1002/pola.1992.080300820
https://doi.org/10.1002/pola.1992.080300820
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Interactions between the silicon hardmask and the photoresist have received considerable attention for utilization of these materials in a trilayer scheme. In contrast, the interactions between the carbon layer and the silicon hardmask have received
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5d8c82118590952e41573c4ff025de0
https://doi.org/10.1117/12.814257
https://doi.org/10.1117/12.814257
Publikováno v:
SPIE Proceedings.
This paper presents robust trilayer lithography technology for cutting-edge IC fabrication and double-patterning applications. The goal is to reduce the thickness of a silicon hardmask so that the minimum thickness of the photoresist is not limited b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4dccfce9230ccb3c1254ae862c65549
https://doi.org/10.1117/12.813816
https://doi.org/10.1117/12.813816
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 29:1313-1317
Pyromellitic dianhydride (PMDA) was condensed with different aromatic diacetic acids via a Perkin reaction to produce new polymers containing the benzylidenephthalide group in the backbone. Yields ranged from 50 to 90% with inherent viscosities rangi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::853be5bbf473a224e0c6bf17c7273e57
https://doi.org/10.1002/pola.1991.080290910
https://doi.org/10.1002/pola.1991.080290910
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
A comparison of bake temperature effects on two hardmask materials was performed. The first hardmask was a silicon-based material, BSI.M06092K, and the second was a titanium-based material, BSI.S07051. The materials have inherently different chemistr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2f2f7e1308e79ce10dc6517f9307e21
https://doi.org/10.1117/12.771701
https://doi.org/10.1117/12.771701