Zobrazeno 1 - 10
of 132
pro vyhledávání: '"Charles J. Alpert"'
Autor:
Jhih-Rong Gao, Yibo Lin, Wen-Hao Liu, Charles J. Alpert, Zhuo Li, Bei Yu, Xiaoqing Xu, David Z. Pan, Natarajan Viswanathan
Publikováno v:
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 37:1237-1250
As very large-scale integration technology shrinks to fewer tracks per standard cell, e.g., from 10 to 7.5-track libraries (and lesser for 7 nm), there has been a rapid increase in the usage of multiple-row cells like two- and three-row flip-flops, b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5dd10287eaa0cb40e70de627c3ea5e23
https://doi.org/10.1109/tcad.2017.2748025
https://doi.org/10.1109/tcad.2017.2748025
Publikováno v:
Integration. 58:47-54
In multiple electron beam lithography (MEBL), a layout is split into stripes and the layout patterns are cut by stripe boundaries, then all the stripes are printed in parallel. If a via pattern or a vertical long wire is overlapping with a stitch, it
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d71e235d35ca3555319ac9c147a4cc8d
https://doi.org/10.1016/j.vlsi.2017.02.004
https://doi.org/10.1016/j.vlsi.2017.02.004
Autor:
Sriram Venkatesh, Wing-Kai Chow, Andrew B. Kahng, Charles J. Alpert, Kwangsoo Han, Derong Liu, Zhuo Li
Publikováno v:
ISPD
The Prim-Dijkstra (PD ) construction [1] was first presented over 20 years ago as a way to efficiently trade off between shortest-path and minimum-wirelength routing trees. This approach has stood the test of time, having been integrated into leading
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc128b0037f2f08ec84bd0eef1491bfc
https://doi.org/10.1145/3177540.3178239
https://doi.org/10.1145/3177540.3178239
Publikováno v:
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 34:726-739
As the feature size of semiconductor process further scales to sub-16 nm technology node, triple patterning lithography (TPL) has been regarded as one of the most promising lithography candidates along with extreme ultraviolet, electron beam lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::447783f095aa73cc5fd9bdfc53b05d15
https://doi.org/10.1109/tcad.2015.2401571
https://doi.org/10.1109/tcad.2015.2401571
Autor:
Charles J. Alpert
Publikováno v:
IEEE Design & Test. 33:93-95
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f46abaa9940ae0cf7056a02a5bca534
https://doi.org/10.1109/mdat.2016.2589222
https://doi.org/10.1109/mdat.2016.2589222
Autor:
Yaoguang Wei, Douglas Keller, Cliff Sze, Charles J. Alpert, Lakshmi Reddy, Sachin S. Sapatnekar, Zhuo Li, Natarajan Viswanathan, Gustavo E. Tellez, Andrew D. Huber
Publikováno v:
ACM Transactions on Design Automation of Electronic Systems. 19:1-37
Routing congestion has become a critical layout challenge in nanoscale circuits since it is a critical factor in determining the routability of a design. An unroutable design is not useful even though it closes on all other design metrics. Fast desig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0a46dc6ca34b355ec2223388fb0c6c2
https://doi.org/10.1145/2566663
https://doi.org/10.1145/2566663
Autor:
David Z. Pan, Earl E. Swartzlander, Myung-Chul Kim, Charles J. Alpert, Zhuo Li, Natarajan Viswanathan, Samuel I. Ward
Publikováno v:
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 32:228-241
As technology scales and frequencies increase, a new hybrid design style emerges, wherein designs contain a mixture of random logic and datapath standard-cell components. This paper demonstrates that conventional half-perimeter wirelength driven plac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c39ba5014626251330ec5c49df003c80
https://doi.org/10.1109/tcad.2012.2233862
https://doi.org/10.1109/tcad.2012.2233862
Autor:
Natarajan Viswanathan, Jhih-Rong Gao, Charles J. Alpert, David Z. Pan, Bei Yu, Wen-Hao Liu, Xiaoqing Xu, Zhuo Li, Yibo Lin
Publikováno v:
ICCAD
As VLSI technology shrinks to fewer tracks per standard cell, e.g., from 10-track to 7.5-track libraries (and lesser for 7nm), there has been a rapid increase in the usage of multiple-row cells like two- and three-row flip-flops, buffers, etc., for d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::793879d2e957a5fcd95dcfc71837e7c0
https://doi.org/10.1145/2966986.2967055
https://doi.org/10.1145/2966986.2967055
Publikováno v:
ASP-DAC
As a promising candidate for next generation lithography, multiple e-beam lithography (MEBL) is able to improve manufacturing throughput using parallel beam printing. In MEBL, a layout is split into stripes and the layout patterns are cut by stripe b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75e5c4d95243593cd65390f076b9ab47
https://doi.org/10.1109/aspdac.2016.7428009
https://doi.org/10.1109/aspdac.2016.7428009