Zobrazeno 1 - 10
of 104
pro vyhledávání: '"Charles D. Schaper"'
Autor:
Charles D. Schaper
Cortisol is a steroid hormone that binds to the glucocorticoid receptor with a diverse range of functions including metabolic, neurologic and immune responses. Prostglandins are lipid autacoids that participate in a wide range of functions including
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ea2f859e13436dbe875362972fc6d497
Autor:
Charles D. Schaper
The signs and symptoms of infectious disease are similar in presentation, such as fever and fatigue, but differ in magnitude, duration, and sequence. Although observable responses of dysfunction are well characterized, the integrative system mechanis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3ccb53138e2eaf3418bbac5a261420fa
Autor:
John D. Bass, Charles T. Rettner, Robert D. Miller, Ho-Cheol Kim, Noel Arellano, Charles D. Schaper, Fahhad H. Alharbi
Publikováno v:
ACS Nano. 5:4065-4072
We report a facile method for creating nanoscopic oxide structures over large areas that is capable of producing high aspect ratio nanoscale structures with feature sizes below 50 nm. A variety of nanostructured oxides including TiO(2), SnO(2) and or
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b217189b17fa4d1a7ef67452a80baaf5
https://doi.org/10.1021/nn2006514
https://doi.org/10.1021/nn2006514
Autor:
Thomas Kailath, K. El-Awady, S.E. Fuller, Weng Khuen Ho, Charles D. Schaper, Arthur Tay, Lay Lay Lee
Publikováno v:
Applied Physics A. 80:899-902
A thermal system is developed to rapidly characterize the linewidth sensitivity of advanced resists to process temperature variations in the photolithographic manufacturing sequence. This thermal array consists of a 7×7 grid of individually programm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9219d984ace1061900de1934e8f5ca38
https://doi.org/10.1007/s00339-003-2343-x
https://doi.org/10.1007/s00339-003-2343-x
Publikováno v:
IEEE Transactions on Control Systems Technology. 12:742-749
A design procedure for feedforward filters is proposed to improve the tracking performance of existing closed-loop systems. A parametric model is not required because it directly utilizes the frequency response of the closed-loop system, which can be
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0733673cc3a145911a0862813d97e270
https://doi.org/10.1109/tcst.2004.825146
https://doi.org/10.1109/tcst.2004.825146
Publikováno v:
Control Engineering Practice. 12:881-892
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75f56440c732d294bfb98da0a8f95bc3
https://doi.org/10.1016/j.conengprac.2003.12.001
https://doi.org/10.1016/j.conengprac.2003.12.001
Publikováno v:
Review of Scientific Instruments. 75:1997-2002
Localized, controlled heating can induce a thermal stress field in silicon wafers and displace the surface topography in three dimensions, which is useful for nanoscale regulation of overlay in microcontact printing systems. Simulation and experiment
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0353ed71768c61c23f76dddc87fe8568
https://doi.org/10.1063/1.1753101
https://doi.org/10.1063/1.1753101
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 17:231-242
Thermal processing of photoresist are critical steps in the microlithography sequence. The postexpose bake (PEB) steps for current DUV chemically amplified resists is especially sensitive to temperature variations. The problem is complicated with inc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::47ee88a3aa64e430d6d7b447b674fe1a
https://doi.org/10.1109/tsm.2004.826959
https://doi.org/10.1109/tsm.2004.826959
Publikováno v:
Journal of Process Control. 14:31-39
A feedforward control scheme is designed to improve performance of conductive heating systems used for lithography in microelectronics processing. It minimizes the loading effects induced by the common processing condition of placement of a quartz ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b3f2bd332c9e3f6e7cfff558efe5be3
https://doi.org/10.1016/s0959-1524(03)00069-6
https://doi.org/10.1016/s0959-1524(03)00069-6
Autor:
K. El-Awady, Arthur Tay, W.-Khuen Ho, Scott E. Fuller, Thomas Kailath, Charles D. Schaper, Lay Lay Lee
Publikováno v:
Microelectronic Engineering. 71:63-68
A thermal array, which consists of a dense distribution of multivariate controlled heat/chill elements, is developed to achieve temperature uniformity of a quartz photomask throughout the processing temperature cycle of ramp, hold and quench. The the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21f529ef9e9c0cfe3a3d8452e0e9436d
https://doi.org/10.1016/j.mee.2003.09.006
https://doi.org/10.1016/j.mee.2003.09.006