Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Charith E. Nanayakkara"'
Autor:
Charles L. Dezelah, L. Fabián Peña, Yves J. Chabal, Joseph P. Klesko, Rezwanur Rahman, Eric C. Mattson, Daniel Moser, Charith E. Nanayakkara, Aaron Dangerfield, Thomas L’Esperance, Ravindra K. Kanjolia
Publikováno v:
Chemistry of Materials. 30:970-981
The need for the conformal deposition of TiO2 thin films in device fabrication has motivated a search for thermally robust titania precursors with noncorrosive byproducts. Alkylamido-cyclopentadienyl precursors are attractive because they are readily
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d00f13adb976ca7a7bfefeffd39cb22c
https://doi.org/10.1021/acs.chemmater.7b04790
https://doi.org/10.1021/acs.chemmater.7b04790
Autor:
Charith E. Nanayakkara, Yves J. Chabal, Guo Liu, Abraham Vega, Ravindra K. Kanjolia, Charles L. Dezelah
Publikováno v:
Langmuir. 33:5998-6004
Uniform and conformal deposition of tin oxide thin films is important for several applications in electronics, gas sensing, and transparent conducting electrodes. Thermal atomic layer deposition (ALD) is often best suited for these applications, but
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::129d265bb2870d2eaa5b46c227fa18db
https://doi.org/10.1021/acs.langmuir.7b00716
https://doi.org/10.1021/acs.langmuir.7b00716
Autor:
Charith E. Nanayakkara, Jiyoung Kim, Antonio T. Lucero, Eric C. Mattson, Lorena Marín, Jean François Veyan, Yves J. Chabal, Carole Rossi, Yuzhi Gao, Jérémy Cure, Alain Estève
Publikováno v:
The Journal of Physical Chemistry C. 121:12780-12788
Deposition of Al on ZnO is used for a number of electronic and catalytic devices as well as for nanoenergetic materials. The interface structure and chemical composition often control the performance of devices. In this study, in situ infrared spectr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::25a7a042c8959ad818c057b46aaf9f24
https://doi.org/10.1021/acs.jpcc.7b02661
https://doi.org/10.1021/acs.jpcc.7b02661
Autor:
Charles L. Dezelah, Charith E. Nanayakkara, Yves J. Chabal, Guo Liu, Abraham Vega, Ravindra K. Kanjolia
Publikováno v:
Chemistry of Materials. 28:8591-8597
In an effort to grow metal oxide films (e.g., MoO3) at low temperatures, a novel molybdenum precursor, Si(CH3)3CpMo(CO)2(η3-2-methylallyl) or MOTSMA, is used with ozone as the coreactant. As is often observed in atomic layer deposition (ALD) process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab73a0fafd7db76e590d4ec0d6319499
https://doi.org/10.1021/acs.chemmater.6b03423
https://doi.org/10.1021/acs.chemmater.6b03423
Autor:
Charith E. Nanayakkara, Yves J. Chabal, Cory K. Perkins, Ryan H. Mansergh, Shawn R. Decker, J.C. Ramos, Douglas A. Keszler, Deok-Hie Park, Yu Huang
Publikováno v:
Solid State Sciences. 61:106-110
Aqueous-processed aluminum oxide phosphate (AlPO) dielectric films were studied to determine how water desorbs and absorbs on heating and cooling, respectively. In-situ Fourier transform infrared spectroscopy showed a distinct, reversible mono- to bi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef4056f1de7cae1bd9a0bf77575cc325
https://doi.org/10.1016/j.solidstatesciences.2016.09.012
https://doi.org/10.1016/j.solidstatesciences.2016.09.012
Autor:
Yves J. Chabal, Luis Fabián Peña, Ronald Martin Pearlstein, Manchao Xiao, Haripin Chandra, Anupama Mallikarjunan, Agnes Derecskei-Kovacs, Xinjian Lei, Charith E. Nanayakkara
Publikováno v:
The Journal of Physical Chemistry C. 120:10927-10935
In situ Fourier transform infrared (FTIR) spectroscopy is used to investigate silicon dioxide deposition on OH-terminated oxidized Si(100) surfaces using two aminosilanes, di-sec-butylaminosilane (DSBAS) and bis(tert-butylamino)silane (BTBAS), with o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f31c8be89976b8d9ade5392c5c35a823
https://doi.org/10.1021/acs.jpcc.6b01803
https://doi.org/10.1021/acs.jpcc.6b01803
Autor:
Manchao Xiao, Yves J. Chabal, Anupama Mallikarjunan, Eric C. Mattson, Ronald Martin Pearlstein, Luis Fabián Peña, Kolade A. Oyekan, Agnes Derecskei-Kovacs, Haripin Chandra, Xinjian Lei, Charith E. Nanayakkara
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 34(8)
Despite the success of plasma-enhanced atomic layer deposition (PEALD) in depositing quality silicon nitride films, a fundamental understanding of the growth mechanism has been difficult to obtain because of lack of in situ characterization to probe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c666258645eda0ef941798d95c0b28d8
https://pubmed.ncbi.nlm.nih.gov/29381069
https://pubmed.ncbi.nlm.nih.gov/29381069
Autor:
Anupama Mallikarjunan, Aaron Dangerfield, Ronald Martin Pearlstein, Xinjian Lei, Charith E. Nanayakkara, Jérémy Cure, Agnes Derecskei-Kovacs, Alain Estève, Yves J. Chabal
Publikováno v:
Chemistry of Materials
Chemistry of Materials, American Chemical Society, 2017, 29 (14), pp.6022-6029. ⟨10.1021/acs.chemmater.7b01816⟩
Chemistry of Materials, 2017, 29 (14), pp.6022-6029. ⟨10.1021/acs.chemmater.7b01816⟩
Chemistry of Materials, American Chemical Society, 2017, 29 (14), pp.6022-6029. ⟨10.1021/acs.chemmater.7b01816⟩
Chemistry of Materials, 2017, 29 (14), pp.6022-6029. ⟨10.1021/acs.chemmater.7b01816⟩
International audience; Aminosilanes are attractive precursors for atomic layer deposition of silicon oxides and nitrides because they are halide-free and more reactive than chlorosilanes. However, the deposition of silicon nitride on oxide substrate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eac7a9fd3d551a11a79919fc76175552
https://hal.laas.fr/hal-01623154
https://hal.laas.fr/hal-01623154
Publikováno v:
The Journal of Physical Chemistry C. 118:25487-25495
Formic acid adsorption and photooxidation on TiO2 nanoparticle surfaces at 296 K have been investigated using transmission FTIR spectroscopy. In particular, the role of adsorbed water in surface coordination, adsorption kinetics, and photoproduct for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0d0ba09153e17a91f142d32746d9769
https://doi.org/10.1021/jp507551y
https://doi.org/10.1021/jp507551y
Publikováno v:
The Journal of Physical Chemistry C. 118:23011-23021
The reactivity of O–H groups on titanium dioxide nanoparticle surfaces with gas-phase carbon dioxide, sulfur dioxide, and nitrogen dioxide is compared. Carbon dioxide, sulfur dioxide, and nitrogen dioxide react with ca. 5, 50, and nearly 100%, resp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::09837a66a3d005af2ed21dffca9ea82b
https://doi.org/10.1021/jp504402z
https://doi.org/10.1021/jp504402z