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Publikováno v: In Photoacoustics June 2023 31

Integrated monitoring of ULK dielectrics out-gassing and measurement of pore sealing efficiency by residual gas analysis technique

Autor: Delsol, R., Chapelon, L., Chaabouni, H., Broussous, L., Schellenberger, M., Ostrovski, A., Normandon, P.

Publikováno v: In Microelectronic Engineering 2007 84(11):2719-2722

Blood Brain Barrier‐Crossing Delivery of Felodipine Nanodrug Ameliorates Anxiety‐Like Behavior and Cognitive Impairment in Alzheimer's Disease.

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Effect of CH4 plasma on porous dielectric modification & pore sealing for advanced interconnect technology nodes

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International Interconnect Technology Conference
International Interconnect Technology Conference, 2006, France. pp.81-83

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::5444949e059cc4008bfa6e5809376ad3
https://hal.archives-ouvertes.fr/hal-00149094

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